Investigation on crystal orientations in EB-PVD YSZ coatings under different substrate rotation mode

Teng, Xiaodan; Peng, Hui; Li, Liuhe; Guo, Hongbo

doi:10.1016/j.jeurceramsoc.2023.05.010

Cited by 5 publications

(2 citation statements)

References 34 publications

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“…This method uses a high-energy electron beam to heat the target material at a specific spot, causing it to melt and sublimate. It is then deposited on the surface of the substrate in molecular form under high vacuum conditions [52][53][54][55].…”

Section: E-beam Evaporationmentioning

confidence: 99%

A Comprehensive Review on Combinatorial Film via High-Throughput Techniques

Wang,

Jiang,

et al. 2023

Materials

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Numerous technological advancements in the 21st century depend on the creation of novel materials possessing enhanced properties; there is a growing reliance on materials that can be optimized to serve multiple functions. To efficiently save time and meet the requirements of diverse applications, high-throughput and combinatorial approaches are increasingly employed to explore and design superior materials. Among them, gradient thin-film deposition is one of the most mature and widely used technologies for high-throughput preparation of material libraries. This review summarizes recent progress in gradient thin-film deposition fabricated by magnetron sputtering, multi-arc ion plating, e-beam evaporation, additive manufacturing, and chemical bath deposition, providing readers with a fundamental understanding of this research field. First, high-throughput synthesis methods for gradient thin films are emphasized. Subsequently, we present the characteristics of combinatorial films, including microstructure, oxidation, corrosion tests, and mechanical properties. Next, the screening methods employed for evaluating these properties are discussed. Furthermore, we delve into the limitations of high-throughput preparation and characterization techniques for combinatorial films. Finally, we provide a summary and offer our perspectives.

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Section: E-beam Evaporationmentioning

confidence: 99%

A Comprehensive Review on Combinatorial Film via High-Throughput Techniques

Wang,

Jiang,

et al. 2023

Materials

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“…Plasma vapor deposition (PVD) technology is widely used in high-end manufacturing industries owing to its environmental friendliness and controllable coating composition and structure [1]. Among myriad factors influencing the quality of the coating, the surface condition emerges as a pivotal determinant encompassing the surface roughness, surface energy, surface stress, and surface crystal structure [2][3][4][5]. A good substrate surface condition has positive effects on the adhesion and stable properties of the deposited coatings [6].…”

Section: Introductionmentioning

confidence: 99%

Effect of Argon Glow Plasma Pretreatment of Pure Ta on Hf Coating Preparation

Yang,

Dang,

Jia

et al. 2023

Coatings

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In order to enhance the bonding strength between coatings and substrates, argon glow plasma pretreatment with various times was conducted on tantalum substrates, followed by hafnium coating deposition. The coating, consisting of deposition and a diffusion layer with nanocrystalline grains of dimensions ranging from 10 to 20 nm, obtained on the substrate pretreated for 1 h, manifested the optimal structure, with a maximum thickness of approximately 14 μm and the best adhesion performance of approximately 9.5 N. The study found that the pretreatment led to grain refinement at a depth of approximately 150 nm and an increase in the crystal face spacing of substrate and high-energy defects. In addition, the crystal defects and lightly increased surface roughness enhanced the surface energy, while the Ta (200) and Ta (211) crystal faces, which had a lower combination energy and a more stable state with Hf atoms than the Ta (110) crystal face, were considerably increased on pretreated substrates with a decrease in the Ta (110) crystal face. Consequently, coating elements exhibited enhanced diffusion within the substrate, leading to the better formation of a gradient structure, which effectively improved the adhesion of coatings. Further, this study offers an efficacious approach to enhance coating adhesion and provides a deeper understanding of plasma pretreatment.

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