Investigations on the topology of structures milled and etched by focused ion beams

Lipp, S.; Frey, L.; Lehrer, C.; Frank, Bettina; Demm, E.; Ryssel, H.

doi:10.1116/1.588630

Cited by 48 publications

(17 citation statements)

References 1 publication

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“…The result depends on the current density but, in any case, a damaged layer is created during the first layers of the deposition (Dai et al ., 2001; White et al ., 2001). This can be avoided by electron beam‐assisted deposition (Lipp et al ., 1996). As the deposition rate is very low, only a thin platinum layer can be deposited with the electron beam within a reasonable time.…”

Section: Resultsmentioning

confidence: 99%

“…The layer beneath, deposited with the electron beam, is thinner and much brighter. Actually, decomposition of the platinum precursor gas molecules by electrons is less complete and therefore this layer is rich in carbon (Lipp et al ., 1996). At the interface between both platinum layers, a bright defect line created by the ion beam is visible.…”

Section: Resultsmentioning

confidence: 99%

“…This is especially useful when the area of interest is easily damaged, a thin top layer for example. Furthermore, the electron beam allows non‐destructive deposition at the sample surface (Lipp et al ., 1996). An energy‐dispersive X‐ray (EDX) system for local elemental analysis is added to our dual‐beam system.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Application of the dual‐beam FIB/SEM to metals research

Sivel¹,

Brand²,

Wang

et al. 2004

Journal of Microscopy

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SummaryThe dual-beam microscope is a combination of a focused ion beam with an electron beam. The instrument used in this work is also equipped with an energy-dispersive X-ray system for local elemental analysis. This powerful tool gives access to specific features inside a material. Two different applications are presented in this paper: (1) cross-sections and transmission electron microscope specimens cut in order to investigate the interface between an aluminium substrate and its epoxy coating; and (2) a grain boundary in a Cu 3 Au alloy. In both cases, the dual beam succeeded where other methods failed.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

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Application of the dual‐beam FIB/SEM to metals research

Sivel¹,

Brand²,

Wang

et al. 2004

Journal of Microscopy

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“…When the surface of a sample is exposed to organometallic gas molecules with a FIB, the gas molecules adsorbed onto the substrate decompose, the organic constituents or fragments with a high vapor pressure vaporize, and the metal atoms remain on the surface such that a metal film is deposited. Today, computer-aided beam scanning control has made 3D fabrications possible [85][86][87][88]. A major advantage of the FIB system is associated with its unique ability to perform, in situ, direct-write electron-and ion-beam nanopatterning, without breaking the vacuum condition.…”

Section: Electrical Transport Measurements On Single Nanowires Using mentioning

confidence: 99%

Template Synthesis of Magnetic Nanowire Arrays

Valizadeh

Strömberg

Strömme

2008

Nanostructured Materials in Electrochemistry

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IntroductionDuring the late 20th century, the growing interest in creating advanced materials using nanoscaled building blocks was employed to develop synthetic techniques for re-engineering existing materials to novel functional materials such as quantum dots, nanodots, nanorods, nanotubes, nanofibrils and quantum wires. These nanowires can act as one-dimensional conductors with interesting electronic and optical properties. Moreover, nanowires may find applications in ultrasensitive chemical and biological sensors.To date, a physical vapor deposition (PVD) technique followed by lithography is usually considered to represent the ultimate method for producing nanoscaled materials. Although a number of successful efforts have been reported on the fabrication of freestanding nanopillars or nanowells using lithographic techniques, there is a whole range of potential obstacles for these approaches. These arise mainly from the fact that, when the technologies are pushed to smaller sizes, the cost rapidly escalate and the tolerances are more difficult to maintain. The lithographic processes used to pattern nanoelectronic structures also currently limit the dimensions of the electronic components such as nanowires. Optical lithography is limited by the wavelength of the light used to produce the wires. Consequently, the wavelength of light used is moving into the deeper regions of the ultraviolet (UV) spectrum, and the cost of fabricating optical components to achieve this is expected to rise at an astronomic rate. These challenges have forced many to seek new nanofabrication techniques, especially those which grow nanostructures directly in the openings of a template. One of the most successful approaches to these nanofabrication methods is known as the membrane-based synthesis of nanomaterials [1][2][3][4], where the membrane acts as a template for the electrodeposition of multilayered nanowires, as well as for single metallic nanowires [5,6]. The advantage of using template synthesis of nanowires is that it can be considered as an alternative solution to overcome the difficulty in fabricating fibrils with very small diameters by lithographic methods [7].

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“…The measurement is the one of the topics in FIB system, which deals with the partial performance of the FIB system itself (Lipp et al 1999;Fu et al 2000) as well as the SEM-like operation (Phaneuf 1999) and the other property measurements Inkson et al 2001). However, although various researches about measurement have been performed, the definite method to determine the reliability of the FIB system has not been reported.…”

Section: Introductionmentioning

confidence: 99%

Study on the method for the reliability test of focused ion beam

et al. 2006

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We investigate the reliability of the focused ion beam (FIB) system with the designed evaluation patterns. The reliability test patterns are composed of three parts, which are the ion beam quality patterns, the ion beam scanning ability patterns and the stage system patterns. The designed patterns are fabricated with the commercial FIB system, and the common nanometer scale measurement systems, the atomic force microscopy and the scanning electron microscopy are used to evaluate the fabricated patterns. The measurement of the absolute length becomes important in the reliability test, and the measurement systems are calibrated with the standard patterns. The measurement results show the proposed patterns are suitable to measure the characteristics of FIB system and also other machines which can fabricate nanometer scale and high-aspect-ratio patterns.

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Investigations on the topology of structures milled and etched by focused ion beams

Cited by 48 publications

References 1 publication

Application of the dual‐beam FIB/SEM to metals research

Application of the dual‐beam FIB/SEM to metals research

Template Synthesis of Magnetic Nanowire Arrays

Study on the method for the reliability test of focused ion beam

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