(Invited) ALD of Thin Films for Lithium-Ion Batteries

Aaltonen, Titta; Miikkulainen, Ville; Gandrud, Knut Bjarne; Pettersen, Anders; Nilsen, Ola; Fjellvaag, H.

doi:10.1149/1.3633684

Cited by 9 publications

(4 citation statements)

References 42 publications

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“…In this section emphasis is given to potential solid electrolyte materials, as these are generally considered the most difficult materials to deposit. For a more thorough review of this subject, both review articles and books are available [71][72][73][74][75][76][77][78][79]. In recent years, ALD has also been studied extensively as a method to modify the interfaces between the electrodes and the electrolyte by forming an artificial SEI-layer [75,80,81].…”

Section: Atomic Layer Deposition Of Conventional Lithium-ion Battery mentioning

confidence: 99%

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

2018

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Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery components is necessary. To that end, metal fluorides could provide interesting new conversion cathode and solid electrolyte materials for future batteries. To be applicable in thin film batteries, metal fluorides should be deposited with a method providing a high level of control over uniformity and conformality on various substrate materials and geometries. Atomic layer deposition (ALD), a method widely used in microelectronics, offers unrivalled film uniformity and conformality, in conjunction with strict control of film composition. In this review, the basics of lithium-ion batteries are shortly introduced, followed by a discussion of metal fluorides as potential lithium-ion battery materials. The basics of ALD are then covered, followed by a review of some conventional lithium-ion battery materials that have been deposited by ALD. Finally, metal fluoride ALD processes reported in the literature are comprehensively reviewed. It is clear that more research on the ALD of fluorides is needed, especially transition metal fluorides, to expand the number of potential battery materials available.

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Section: Atomic Layer Deposition Of Conventional Lithium-ion Battery mentioning

confidence: 99%

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

2018

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“…[15][16][17] To our knowledge, there are only preliminary reports on Li x Ti y O z deposition by ALD. [18][19][20] In the present study we combined the TiO 2 and Li 2 O-LiOH binary ALD processes to prepare the Li x Ti y O z ternary material. For the TiO 2 subcycle we studied the effect of alkoxide and chloride based chemistries on Li x Ti y O z growth.…”

Section: Introductionmentioning

confidence: 99%

Atomic layer deposition of LixTiyOz thin films

et al. 2013

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Atomic layer deposition (ALD) was employed to deposit ternary films of Li x Ti y O z. The film growth at a deposition temperature of 225 uC was studied using both titanium tetra-isoropoxide (Ti(O i Pr) 4) and titanium tetrachloride (TiCl 4) as titanium precursors. Lithium tert-butoxide (LiO t Bu) was applied as the lithium source and water was used as the oxygen source for all metal precursors. The type of titanium precursor chosen strongly affected film growth: with TiCl 4 the resulting Li x Ti y O z films were highly airsensitive and the lithium concentration was low, whereas with Ti(O i Pr) 4 the films were relatively stable in air and with a lithium content which was easily controlled over a wide range. Film characterization indicated that part of the lithium in the film migrated onto the surface and formed carbonates. Films with suitable lithium contents crystallized into the spinel Li 4 Ti 5 O 12 structure upon post-deposition annealing.

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“…In recent years, its applications to secondary batteries have attracted extensive research attention. 14,15 Some studies have also reported on the use of Li 3 PO 4 for solid electrolytes. 16,17 However, in the case of LiPON, which has a higher conductivity than Li 3 PO 4 , deposition must be performed with a constant composition ratio for the four constituent elements: Li, P, O, and N. Plasma assistance is also considered necessary 18 because of the difficulty of nitriding at low temperatures.…”

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confidence: 99%

Thermal Atomic Layer Deposition of Lithium Phosphorus Oxynitride as a Thin-Film Solid Electrolyte

Shibata¹

2016

J. Electrochem. Soc.

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In this study, thermal atomic-layer deposition (ALD) is utilized to deposit a film of lithium phosphorus oxynitride (LiPON) to improve the solid-electrolyte performance of thin-film lithium batteries, increasing their viability for high-energy-storage applications. This technique enabled the successful fabrication of a carbon-free LIPON film using a deposition sequence constructed on the basis of a phosphate backbone and film deposition temperatures of 400-500 • C. The obtained film has an ionic activity of 3.2 × 10 −7 S cm −1 and an activation energy of 0.57 eV, values that are largely equivalent to those of sputtered LiPON films. Characterization of the film revealed that the thermal ALD-based film deposition is highly conformal, as the LiPON film is deposited deep (several hundreds of nanometers) into the grain boundaries of the lithium cobalt dioxide and the pores in this film are several tens of nanometers in diameter. These findings suggest that the use of thermal ALD to deposit LiPON films has a wide range of potential applications in battery technologies.

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(Invited) ALD of Thin Films for Lithium-Ion Batteries

Cited by 9 publications

References 42 publications

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective

Atomic layer deposition of LixTiyOz thin films

Thermal Atomic Layer Deposition of Lithium Phosphorus Oxynitride as a Thin-Film Solid Electrolyte

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