Abstract:The taxonomy of semiconductor technology nodes has long since decoupled from the minimum critical dimension (CD) associated with the designs, but each new node nonetheless features a variety of difficult challenges. CD control and placement budgets continue to tighten with each node as new and more complex RET strategies such as multi-layer patterning, model-based assist feature, pixelated illumination sources, and negative tone develop processes are deployed. Optical Proximity Correction (OPC) is of course a… Show more
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