Ion-assisted deposition with a new plasma source

Matl, K.; Klug, Werner; Zöller, A.

doi:10.1016/0921-5093(91)90473-z

Cited by 27 publications

(6 citation statements)

References 4 publications

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“…The probes are operated in an industrial batch system for the production of optical coatings employing PIAD. Systems such as the SYRUSpro by Leybold Optics combine electron beam evaporators (EBG) and a plasma source (advanced plasma source (APS) [15]), which generates a flux of energetic ions impinging onto the substrates and thereby densifying the growing films by energy and momentum input. The basic scheme is shown in figure 2.…”

Section: Process Environmentmentioning

confidence: 99%

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

Styrnoll¹,

Harhausen²,

Lapke³

et al. 2013

Plasma Sources Sci. Technol.

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The application of a multipole resonance probe (MRP) for diagnostic and monitoring purposes in a plasma ion-assisted deposition (PIAD) process is reported. Recently, the MRP was proposed as an economical and industry compatible plasma diagnostic device (Lapke et al 2011 Plasma Sources Sci. Technol. 20 042001). The major advantages of the MRP are its robustness against dielectric coating and its high sensitivity to measure the electron density. The PIAD process investigated is driven by the advanced plasma source (APS), which generates an ion beam in the deposition chamber for the production of high performance optical coatings. With a background neutral pressure of p 0 ∼ 20 mPa the plasma expands from the source region into the recipient, leading to an inhomogeneous spatial distribution. Electron density and electron temperature vary over the distance from substrate (n e ∼ 10 9 cm −3 and T e,eff ∼ 2 eV) to the APS (n e 10 12 cm −3 and T e,eff ∼ 20 eV) (Harhausen et al 2012 Plasma Sources Sci. Technol. 21 035012). This huge variation of the plasma parameters represents a big challenge for plasma diagnostics to operate precisely for all plasma conditions. The results obtained by the MRP are compared to those from a Langmuir probe chosen as reference diagnostics. It is demonstrated that the MRP is suited for the characterization of the PIAD plasma as well as for electron density monitoring. The latter aspect offers the possibility to develop new control schemes for complex industrial plasma environments.

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Section: Process Environmentmentioning

confidence: 99%

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

Styrnoll¹,

Harhausen²,

Lapke³

et al. 2013

Plasma Sources Sci. Technol.

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show abstract

“…This restriction has led to the development of plasma sources which are able to deliver higher momentum and energy flux densities for batch systems used in the optics industry. An implementation of this so-called plasma ion assisted deposition (PIAD) is the Advanced Plasma Source (APS) by Leybold Optics [6].…”

Section: Introductionmentioning

confidence: 99%

On plasma ion beam formation in the Advanced Plasma Source

Harhausen

Brinkmann

Foest

et al. 2012

Plasma Sources Sci. Technol.

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The Advanced Plasma Source (APS) is employed for plasma ion-assisted deposition (PIAD) of optical coatings. The APS is a hot cathode dc glow discharge which emits a plasma ion beam to the deposition chamber at high vacuum (p 2 × 10 −4 mbar). It is established as an industrial tool but to date no detailed information is available on plasma parameters in the process chamber. As a consequence, the details of the generation of the plasma ion beam and the reasons for variations of the properties of the deposited films are barely understood. In this paper the results obtained from Langmuir probe and retarding field energy analyzer diagnostics operated in the plasma plume of the APS are presented, where the source was operated with argon. With increasing distance to the source exit the electron density (n e ) is found to drop by two orders of magnitude and the effective electron temperature (T e,eff ) drops by a factor of five. The parameters close to the source region read n e 10 11 cm −3 and T e,eff 10 eV. The electron distribution function exhibits a concave shape and can be described in the framework of the non-local approximation. It is revealed that an energetic ion population leaves the source region and a cold ion population in the plume is build up by charge exchange collisions with the background neutral gas. Based on the experimental data a scaling law for ion beam power is deduced, which links the control parameters of the source to the plasma parameters in the process chamber.

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“…This applies also to the employed plasma sources. An example for such a source is the so called Advanced Plasma Source (APS) designed by Bühler, a gridless hot cathode glow discharge with magnetic field support that forms an ion beam by plasma expansion [4]. Investigating the APS and exploring possibilities for its further improvement was one of the subjects of the recent collaborative research effort PluTO.…”

Section: Physics Of the Advanced Plasma Source: A Review Of Recent Ex...mentioning

confidence: 99%

Physics of the Advanced Plasma Source: a review of recent experimental and modeling approaches

Brinkmann

Harhausen

Lapke

et al. 2015

Plasma Phys. Control. Fusion

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The Advanced Plasma Source (APS), a gridless hot cathode glow discharge capable of generating an ion beam with an energy of up to 150 eV and a flux of 10 19 s −1 , is a standard industrial tool for the process of plasma ion-assisted deposition (PIAD). This manuscript details the results of recent experimental and modeling work aimed at a physical understanding of the APS. A three-zone model is proposed which consists of (i) the ionization zone (the source itself) where the plasma is very dense, hot, and has a high ionization rate, (ii) the acceleration zone (of ∼20 cm extension) where a strong outward-directed electric field accelerates the primary ions to a high kinetic energy, and (iii) a drift zone (the rest of the process chamber) where the emerging plasma beam is further modified by resonant charge exchange collisions that neutralize some of the energetic ions and generate, at the same time, a flux of slow ions.

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Ion-assisted deposition with a new plasma source

Cited by 27 publications

References 4 publications

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

Process diagnostics and monitoring using the multipole resonance probe in an inhomogeneous plasma for ion-assisted deposition of optical coatings

On plasma ion beam formation in the Advanced Plasma Source

Physics of the Advanced Plasma Source: a review of recent experimental and modeling approaches

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