1982
DOI: 10.1016/0040-6090(82)90187-0
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Ion-based growth of special films: Techniques and mechanisms

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Cited by 95 publications
(13 citation statements)
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“…For this purpose, we have computer generated amorphous carbon structures by quenching the liquid under high (megabar) pressures. This procedure resembles, in a way, the various ion-assisted deposition processes (though not directly related to their actual kinetics), since it is believed [12] that during deposition the incoming ions with high kinetic energies produce localized melting and subsequent rapid quenching of a small region.…”
mentioning
confidence: 98%
“…For this purpose, we have computer generated amorphous carbon structures by quenching the liquid under high (megabar) pressures. This procedure resembles, in a way, the various ion-assisted deposition processes (though not directly related to their actual kinetics), since it is believed [12] that during deposition the incoming ions with high kinetic energies produce localized melting and subsequent rapid quenching of a small region.…”
mentioning
confidence: 98%
“…At higher arc current the ion energy is higher, S is relaxed as the atoms penetrate more deeply and induces knock-on-collisions due to which underlying atoms get even deeper. Thermal spike model [11] about the S of a-C films is valid, according to which local heating and immediate chilling occurs at low ion energy that leads to high S in films but at higher ion energy the atoms create a large region to flow and reduced value of S obtained V. Acknowledgements…”
Section: Resultsmentioning
confidence: 99%
“…Although the quench from the melt simulation method is not directly related to the kinetics of the sputtering and physical vapour techniques of depositing the film, there is, however, a similarity with the ion deposition process for producing the film. The kinetics of melt-quenching [40,41] and hydrogen-induced stress relaxation [42,43] resembles the thermal spike model which assumes that during deposition the incoming ions with high kinetic energies produce localized melting and subsequent rapid quenching of small localized regions of the material. Therefore, although the network structures produced by melt-quenching do not represent the non-equilibrium structures of ion deposited films, they represent the equilibrium, relaxed ground state of typical ta-C films.…”
Section: 3mentioning
confidence: 99%