2003
DOI: 10.1557/proc-792-r12.5
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Ion Beam Assisted Deposition

Abstract: The beneficial roles energetic ions play in thin film vacuum processes have long been recognized by the vacuum coating community. Optical coaters were among the first to adopt the process in the form of concurrent, low energy, directed ion beam bombardment of physical vapor deposition [electron beam] coatings for producing dense, adherent, robust, and environmentally resistant optical coatings. The international research and development community has also been actively pursuing the study of ion beam assisted d… Show more

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Cited by 11 publications
(11 citation statements)
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“…3 In this letter, we report the growth of ultrahydrophilic and transparent nanocrystalline cubic and mixed phase zirconium oxide (ZrO 2 ) films produced by ion beam assisted deposition (IBAD). [4][5][6][7] This nanostructurally stabilized chemically pure cubic phase has been shown 8 to possess hardness as high as 16 GPa and a bulk modulus of 235 GPa, 8 which is in good agreement with a model calculation based on a projector augmented wave first-principles method. 9 Furthermore, first-principles calculations 9,10 indicated that both the modulus and surface energy of cubic ZrO 2 phase is larger than those for both monoclinic and tetragonal phases.…”
mentioning
confidence: 68%
“…3 In this letter, we report the growth of ultrahydrophilic and transparent nanocrystalline cubic and mixed phase zirconium oxide (ZrO 2 ) films produced by ion beam assisted deposition (IBAD). [4][5][6][7] This nanostructurally stabilized chemically pure cubic phase has been shown 8 to possess hardness as high as 16 GPa and a bulk modulus of 235 GPa, 8 which is in good agreement with a model calculation based on a projector augmented wave first-principles method. 9 Furthermore, first-principles calculations 9,10 indicated that both the modulus and surface energy of cubic ZrO 2 phase is larger than those for both monoclinic and tetragonal phases.…”
mentioning
confidence: 68%
“…Ion beam assisted deposition (IBAD) is a technique that usually combines sputtering or electron beam evaporation with the ion implantation concurrent ion beam bombardment, producing a final coating with a highly intermixed interface [110] and with a less built-in strain compared to other PVD techniques [28,[111][112][113]. The effect of IBAD on the coating depends on many parameters such as: (i) ion energy, (ii) ion to atom arrival ratio, (iii) angle of ion incidence, (iv) pressure, and (v) temperature [114].…”
Section: Physical Vapor Deposition (Pvd) Techniquesmentioning
confidence: 99%
“…Ion beam-assisted deposition technique has been known as a promising way to produce highly adherent films (Guzman et al ., 2002;Hirvonen, 2004) with tunable surface and substrate-interface structures (Zhang et al ., 2003;Yu et al ., 2006;Namavar et al ., 2007). During the IBAD process, the deposition of film is performed with a combination of physical vapor evaporation and concurrent ion beams bombardment under high vacuum (10 −8 torr base pressure).…”
Section: Introductionmentioning
confidence: 99%