Ion Beam Deposition of Amorphous Carbon Films With Diamond Like Properties

Abstract

Carbon films were deposited on silicon, quartz, and potassium bromide substrates from an ion beam. Growth rates were approximately 0.3 μm/hour. The films were featureless and amorphous and contained only carbon and hydrogen in significant amounts. The density and carbon/hydrogen ratio indicate the film is a hydrogen deficient polymer. One possible structure, consistent with the data, is a random network of methylene linkages and tetrahedrally coordinated carbon atoms.

Semiconducting Amorphous Film Containing Carbon Nitrogen and Boron

“…According to this relation, the coatings obtained in this study relate closer to graphite than to the diamond-like films which are denser and richer in hydrogen. Further distinction can be made through an empirical chemical test (12) based on the stability of coatings towards a treatment with a mixture of three parts conc H2SO4 and one part conc HNO3 at 80~ This treatment dissolves hydrocarbon polymers and graphitic carbons but will not attack diamond. The reagent attacks glassy carbon, but at a relatively slow rate.…”