Preparation Techniques for Diamond-Like Carbon

Catherine, Y.

doi:10.1007/978-1-4684-5967-8_10

Cited by 54 publications

(19 citation statements)

References 69 publications

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“…The strong increase of N/C at a low content of N 2 in the gas mixture seems to be mainly due to the incorporation of nitrogen species coming from the plasma on the film surface during deposition [26]. Similar results have been reported for material grown in FCVA system [27] and Electron Cyclotron Wave Resonance [28]. The increase of the nitrogen content led to a sudden loss of sp 3 bonding, and consequent formation of fine graphite sp 2 bonded structures embedded in sp 3 matrix, which is to be further discussed later in the XPS analysis of the a-CN:H films.…”

Section: Resultssupporting

confidence: 58%

Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

Hao

Liu

Xue

2007

Journal of Non-Crystalline Solids

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Section: Resultssupporting

confidence: 58%

Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

Hao

Liu

Xue

2007

Journal of Non-Crystalline Solids

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“…The combined influence of these two parameters was reflected by the value of the selfbias potential, V bias which is the dc potential developed on the target during plasma ignition ͑see Table I͒. 33,36 …”

Section: Resultsmentioning

confidence: 99%

Silica-supported silver nanoparticles: Tailoring of structure-property relationships

Barreca

Gasparotto

Maragno

et al. 2005

Journal of Applied Physics

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Silica-supported silver nanoparticles were obtained by rf sputtering from Ar plasmas under soft synthesis conditions, with particular attention to the combined influence of rf power and total pressure on the system composition, nanostructure, morphology, and optical properties. In order to attain a thorough insight into the nucleation and growth phenomena of Ag nanoparticles on the silica substrate, several in situ and ex situ characterization techniques were used. In particular, a laser reflection interferometry system was employed for a real-time monitoring of the deposition process, providing useful and complementary information with respect to the other ex situ techniques ͑x-ray photoelectron spectroscopy and x-ray excited Auger electron spectroscopy, glancing incidence x-ray diffraction, atomic force microscopy, optical-absorption spectroscopy, and transmission electron microscopy͒. The above investigations evidenced the formation of silver-based nanosystems ͑average crystallite size ഛ10 nm͒, whose features ͑metal content, Ag particle size and shape, structure and optical properties͒ could be carefully tailored by moderate and controlled variations of the synthesis parameters.

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“…Films of a-C:H are commonly produced via plasma deposition techniques at growth rates between 0.1 and 1 nm/s. 3 For practical technological applications, production costs must be minimized. This implies that the growth rate should be increased, while maintaining good film quality.…”

Section: ͓S0003-6951͑96͒02228-0͔mentioning

confidence: 99%

Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate

Gielen

Sanden

Schram

1996

Applied Physics Letters

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High quality diamondlike a-C:H has been deposited, at low ion bombardment energies, from an expanding thermal argon/acetylene plasma at high growth rate. It is observed that quality improvement, in terms of hardness, is equivalent to maximization of the refractive index. The highest refractive indices are obtained when the admixed acetylene flow and the argon ion flux emanating from the plasma source are comparable in magnitude, which suggests critical loading. This also indicates that the acetylene has to be dissociated only once. Combination with the observed quality behavior at higher deposition rates suggests that there is one preferred hydrocarbon radical for deposition, probably C2H.

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Preparation Techniques for Diamond-Like Carbon

Cited by 54 publications

References 69 publications

Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

Effect of N2/CH4 flow ratio on microstructure and composition of hydrogenated carbon nitride films prepared by a dual DC-RF plasma system

Silica-supported silver nanoparticles: Tailoring of structure-property relationships

Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate

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