ChemInform Abstract (MBE: molecular beam epitaxy). The incorporation and electrical activation of As+ ions simultaneously implanted in Si(100) epilayers during MBE growth (700 rc C) are reported and the crystal quality and electric properties of the epilayers are studied by Hall measurements, four-point probe, RBS (Rutherford backscattering spectrometry), SIMS, and XTEM. Bulk-like mobilities, 100% activation, and excellent crystalline quality are obtained by using 1 keV As+ ions at growth rates of 0.1-0.3 nm/s. No deterioration of the crystal quality is observed for As levels in the range 1016 to 2•1020 cm-3 at 700 rc C, but at lower growth temp., As solubility limits the incorporation of As. The lower temp. limit for epitaxial growth during simultaneous ion beam doping with 1 keV As+ is found to be 375 c C.