2015
DOI: 10.1016/j.ceramint.2015.03.071
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Ion beam induced evolution of surface morphology and optical properties of SnO2–ZnO nanocomposite thin films

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Cited by 3 publications
(3 citation statements)
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“…Previously, some researchers found that ZnO films doped with Sn could produce special morphological nanostructures. [ 22 ] Sn‐doped ZnO films are prone to exhibit special morphology, which is usually ascribed to the fact that the segregated Sn clusters as catalysts facilitate the formation of ZnO nanostructures on the film surface. It should be pointed out that only when sufficient energy is obtained can zinc atoms undergo surface migration and stay in suitable positions to nucleate with O and gradually grow into ZnO nanostructures, finally forming a special film morphology.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Previously, some researchers found that ZnO films doped with Sn could produce special morphological nanostructures. [ 22 ] Sn‐doped ZnO films are prone to exhibit special morphology, which is usually ascribed to the fact that the segregated Sn clusters as catalysts facilitate the formation of ZnO nanostructures on the film surface. It should be pointed out that only when sufficient energy is obtained can zinc atoms undergo surface migration and stay in suitable positions to nucleate with O and gradually grow into ZnO nanostructures, finally forming a special film morphology.…”
Section: Resultsmentioning
confidence: 99%
“…Therefore, an appropriate annealing temperature or laser irradiation is an important external condition. [20,22] EDX analysis was performed on the sample heattreated at 500 C so that to learn the distribution of elements in the sample. Figure 2 shows the elemental mapping images of the sample.…”
Section: The Structural and Morphological Evolution Of The Samplesmentioning
confidence: 99%
“…Ion beams have been used to modify semiconductors since the 1950s [18][19][20] to control properties including electrical [21,22], optical [22][23][24][25], mechanical [21,26], thermal [27] and surface morphology [23,28]. Such methods can be similarly applied to the tailoring of these characteristics in semiconductor NWs [1,4,13,29,30].…”
Section: Introductionmentioning
confidence: 99%