Owing
to the rigid standards of manufacturing semiconductor components,
decrease of the moisture to parts-per-billion (ppb), at a global level,
is always vital but extremely nerve-racking in the production of high-purity
gases. Herein, typical adsorbents including oxides (SiO2 and γ-Al2O3), zeolites (4A and NaX),
and metal–organic frameworks (MOFs; HKUST-1, UiO-66, and ZIF-8)
are investigated with respect to the abilities of ultradeep dewatering
from N2. Compared with other adsorbents, NaX performs much
better on both dewatering efficiency (DE, from 2750 to 66 ppb) and
the adsorption capacity (AC, 1.55 × 104 L N2·g–1). Moreover, it is for the first time
experimentally and theoretically proved that the dewatering ability
of X zeolite mainly depends on its cation species (Na+,
Li+, K+, Cs+, Mg2+, Ca2+, Sr2+, or Ba2+), the forces between
the zeolite and H2O, and the number of H2O molecules
per cell of the zeolite. CaX thus shows a fascinating DE from 2750
to 33 ppb, a huge AC of 9.08 × 104 L N2·g–1, and an ideal reusability, compared with
results of the scarce contributions reported to date.