Ion Molecule and Dust Particle Formation in Ar/CH4, Ar/C2H2 and Ar/C3H6 Radio‐frequency Plasmas

T., H.; Thieme, G.; Fröhlich, Maik; Kersten, Holger; Hippler, R.

doi:10.1002/ctpp.200510043

Cited by 35 publications

(19 citation statements)

References 24 publications

(26 reference statements)

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“…4.4. The intensity of the scattered laser light exhibits a periodical behavior that is already known from previous works [83,84]. Approximately 35 s after the ignition of the acetylene discharge the whole region between the electrodes is filled with dust particles and the intensity of the scattered light exhibits a maximum.…”

Section: Influence Of Hydrogen Atoms On Dust Particle Formationsupporting

confidence: 52%

Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

2008

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Section: Influence Of Hydrogen Atoms On Dust Particle Formationsupporting

confidence: 52%

Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

2008

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“…The maxima are located at around 58, 70, 82, 96, 110, 123, 135 and 149 amu, it seems that the period Δ m is between 12 and 15 amu (C, CH, CH 2 , CH 3 ). This periodicity can be explained by a polymerization process where CH x groups are attached to several molecules 16–18…”

Section: Resultsmentioning

confidence: 99%

Mass Spectrometric Investigations on Aluminum Isopropoxide Containing Plasmas

Niemietz¹,

Fröhlich²,

Kersten³

2012

Plasma Processes & Polymers

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Plasma diagnostics have been used to understand chemical reactions that take place in a radio frequency plasma containing aluminum isopropoxide (ATI). Mass spectrometry was used to detect the formed reaction products in the plasma focusing on monomeric ATI. The organometallic precursor is fragmented in the plasma and forms organoaluminum compounds. These molecules are found at masses between 40 and 200 amu. On the basis of the mass spectrometric investigations processes and paths of fragmentation are proposed. A particular importance has the mass 59 amu, which can inter alia be assigned to a hydrocarbon group fragmented from ATI. This group is included three times in a monomeric ATI molecule. Beside this hydrocarbon group detached methyl groups seem to be the starting point for polymerization processes, which are leading to organic molecules (CnHm) with higher masses.

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“…The neutral gas chemistry is just one aspect. Mass spectroscopic measurements also reveal the existence of large negative and positive ions and their complex chemistry [14,16,69]. …”

Section: Fig 24mentioning

confidence: 99%

Some Aspects of Reactive Complex Plasmas

Berndt¹,

Kovačević

Stefanović

et al. 2009

Contrib. Plasma Phys.

107

103

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Reactive plasmas are nowadays widely used for technological applications. The spontaneous formation and growth of dust is a phenomenon frequently observed in such plasmas. The formation of dust particles has been observed in a great variety of different discharge types and in different kind of gases or gas mixtures. Due to the large variety of different phenomena that can be observed in reactive complex plasmas this article will address some selected (general) problems and examples that are specific for the physics and chemistry of such systems. These examples concern the formation and growth of dust particles in reactive plasmas, the mechanisms responsible for that growth processes, the spatial distribution of the dust particles within the discharge, the response of the plasma to the formation and growth of dust particles and some technological aspects.

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Ion Molecule and Dust Particle Formation in Ar/CH₄, Ar/C₂H₂ and Ar/C₃H₆ Radio‐frequency Plasmas

Cited by 35 publications

References 24 publications

Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

Influence of hydrogen atoms on the growth of carbon based nanoparticles and of thin films from reactive plasmas

Mass Spectrometric Investigations on Aluminum Isopropoxide Containing Plasmas

Some Aspects of Reactive Complex Plasmas

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