Ion projection lithography for resistless patterning of thin magnetic films

Bruenger, W. H.; Torkler, M.; Dzionk, C.; Terris, B. D.; Folks, L.; Weller, D.; Rothuizen, H.; Vettiger, P.; Stangl, G.; Fallmann, W.

doi:10.1016/s0167-9317(00)00410-x

Cited by 14 publications

(5 citation statements)

References 5 publications

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“…Brunger et al 44. have used the IPLM‐02 ion projector to perform direct milling on a 35‐nm‐thick Au film using an open stencil mask with 8.7‐demagnification ion optics.…”

Section: Nanostructures Printed By Iplmentioning

confidence: 99%

“…Thus, IPL is acceptable for magnetic media applications. Earlier, Brunger et al 44. also used the IPLM‐02 projector to mill a magnetic FePt film using a 10 16 He + ions cm −2 dose at 75 keV and reported that the averaged magnetic island size is 340 nm.…”

Section: Nanostructures Printed By Iplmentioning

confidence: 99%

“…By experimental evidence and numerical simulation, Dietzel et al 45. and Brunger et al 44. 47 noticed that Xe + or Ar + are more effective by two orders of magnitude compared to He + .…”

Section: Nanostructures Printed By Iplmentioning

confidence: 99%

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Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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Ion projection lithography (IPL) is an emerging technology and a major candidate for the next-generation lithography (NGL) designed to complement and supplement current optical lithographic techniques for future chip manufacturing. In this Review, the recent developments of IPL technology are examined with an emphasis on its ability to fabricate a wide variety of nanostructures for the semiconductor industry. Following an introduction of the uniqueness and strength of the technology, the basics of ion-source development and ion-target interactions with and without chemical enhancement are presented. The developments in equipment systems, masks, and resists are subsequently studied. The resolution of printed nanostructures and the corresponding throughput of the current system are assessed for NGL. Finally, concluding remarks are presented to summarize the strengths and weaknesses of the current technology and to suggest the scope for future improvement.

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“…Brunger et al 44. have used the IPLM‐02 ion projector to perform direct milling on a 35‐nm‐thick Au film using an open stencil mask with 8.7‐demagnification ion optics.…”

Section: Nanostructures Printed By Iplmentioning

confidence: 99%

Section: Nanostructures Printed By Iplmentioning

confidence: 99%

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Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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“…They also show that the implanted Cr + is removed by ion-milling at about the same rate as NiFe. PIXE (and RBS) also provides a direct measurement of film thickness, in units of atoms per cm 2 . By assuming that the standard bulk density applies for the thin deposited film, the film thickness was inferred.…”

Section: Full-film Experimentsmentioning

confidence: 99%

“…The disadvantages of this technique are that (a) lithography resolution limits are being challenged by modern device design, and that (b) patterning by physical removal of material leaves an uneven surface on which to build subsequent structures necessary for the devices to function. In response, several authors have suggested means to pattern magnetic films without removing material [1][2][3][4][5][6][7]. Among these, the use of ion beams is particularly attractive as it is possible to expose entire wafers in one step (unlike with electron beam writing) as well as to achieve better resolution than with photolithography [8].…”

Section: Introductionmentioning

confidence: 99%

Localized magnetic modification of permalloy using Cr⁺ion implantation

Folks

Fontana

Gurney

et al. 2003

J. Phys. D: Appl. Phys.

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Doping ferromagnetic nickel–iron alloys with chromium causes the Curie temperature to be reduced. We have demonstrated that solid state solutions of Ni–Fe–Cr can be formed by implanting Cr ions into ferromagnetic NiFe alloy films, thus creating paramagnetic films. We find that the magnetic moment and coercivity decrease steadily with Cr+ dose, reaching zero at room temperature with the onset of paramagnetism. Using Cr+ implantation in conjunction with a lithographic mask we have patterned continuous Ni80Fe20 films into separate regions that are ferromagnetic and paramagnetic at room temperature. This magnetic patterning process may have applications for the manufacture of magnetic write heads, such as for the notching process used to constrain the stray field from the write gap.

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