Ionic liquid crystal – mediated preparation of reduced graphene oxide under microwave irradiation

Mangaiyarkarasi, R; Santhiya, N.; Umadevi, S.

doi:10.1016/j.colsurfa.2022.128673

Cited by 7 publications

(6 citation statements)

References 55 publications

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“…Umadevi et al employed the dielectric properties of ionic liquid crystal (ILC) to promote fast-speed microwave heating to prepare rGO. The reduction of GO by ILC exhibits a better effect compared with other reduction methods [ 30 ]. Compared with the several aforementioned reduction methods, the electrochemical reduction has the merits of environmental protection, energy-saving, and excellent controllability.…”

Section: Luminescence Mechanismmentioning

confidence: 99%

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Photoluminescence and Fluorescence Quenching of Graphene Oxide: A Review

Xiao

Zhou

et al. 2022

Nanomaterials

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In recent decades, photoluminescence (PL) material with excellent optical properties has been a hot topic. Graphene oxide (GO) is an excellent candidate for PL material because of its unique optical properties, compared to pure graphene. The existence of an internal band gap in GO can enrich its optical properties significantly. Therefore, GO has been widely applied in many fields such as material science, biomedicine, anti-counterfeiting, and so on. Over the past decade, GO and quantum dots (GOQDs) have attracted the attention of many researchers as luminescence materials, but their luminescence mechanism is still ambiguous, although some theoretical results have been achieved. In addition, GO and GOQDs have fluorescence quenching properties, which can be used in medical imaging and biosensors. In this review, we outline the recent work on the photoluminescence phenomena and quenching process of GO and GOQDs. First, the PL mechanisms of GO are discussed in depth. Second, the fluorescence quenching mechanism and regulation of GO are introduced. Following that, the applications of PL and fluorescence quenching of GO–including biomedicine, electronic devices, material imaging–are addressed. Finally, future development of PL and fluorescence quenching of GO is proposed, and the challenges exploring the optical properties of GO are summarized.

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Section: Luminescence Mechanismmentioning

confidence: 99%

Section: Figurementioning

confidence: 99%

Photoluminescence and Fluorescence Quenching of Graphene Oxide: A Review

Xiao

Zhou

et al. 2022

Nanomaterials

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“…Epitaxial graphene growth on silicon carbide by thermal decomposition can produce large-scale and high-quality graphene, − whereas this procedure is only suitable for the synthesis of a graphene film on semiconductors because the graphene film can directly be grown on silicon carbide. Chemical vapor deposition (CVD) is a popular method of synthesizing large-scale and large-area graphene films with low-cost production. − For the synthesis of graphene powder, the oxidation–reduction method is widely utilized to fabricate reduced graphene oxide with large-scale and low-cost production. − However, the electrical properties of the reduced graphene oxide are poor due to the appearance of a large number of defects and the oxygen content on its surface. For the synthesis of a turbostratic graphene film, Wei et al modified the CVD method for the growth of a turbostratic graphene film by growing another graphene on top of single-layer graphene .…”

Section: Introductionmentioning

confidence: 99%

“… 13 − 15 For the synthesis of graphene powder, the oxidation–reduction method is widely utilized to fabricate reduced graphene oxide with large-scale and low-cost production. 16 − 18 However, the electrical properties of the reduced graphene oxide are poor due to the appearance of a large number of defects and the oxygen content on its surface. For the synthesis of a turbostratic graphene film, Wei et al modified the CVD method for the growth of a turbostratic graphene film by growing another graphene on top of single-layer graphene.…”

Section: Introductionmentioning

confidence: 99%

Growth of High-Purity and High-Quality Turbostratic Graphene with Different Interlayer Spacings

2023

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Turbostratic graphene is a multilayer graphene, which has exotic electrical properties similar to those of monolayer graphene due to the low interlayer interaction. Additionally, the stacking structure of the turbostratic multilayer graphene can decrease the effect of attachment of charge impurities and surface roughness. This paper explores the growth of high-purity and high-quality turbostratic graphene with different interlayer spacings by calcining ferric chloride and sucrose at 1000 °C for 1 h under an argon atmosphere. X-ray diffraction patterns and Raman results imply that the turbostratic graphene contains two different interlayer spacings: 3.435 and 3.55 Å. The 3.55 Å turbostratic graphene is on top of the 3.435 Å turbostratic graphene, and there is an AB stacking pattern between the topmost graphene layer of 3.435 Å turbostratic graphene and the first graphene layer of the 3.55 Å turbostratic graphene, with an interlayer spacing of 3.35 Å. The two different interlayer spacings of turbostratic graphene arise from different cooling rates between the higher temperature ranges (>700 °C) and lower temperatures (<700 °C).

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“…However, the quality of the resultant graphene powder is low due to the presence of high level of deflects and oxygen content on the graphene surface. 15 In 2014, Binbin Zhang et al propose the different method which can achieve mass production of high-quality graphene with low cost by calcinating glucose and ferric chloride solution under argon atmosphere at 700 °C for 6 hours. 16 For this method, the iron is utilized as metal catalyst for synthesis of graphene.…”

Section: Introductionmentioning

confidence: 99%