Ionic-liquid micro ion source array for flexyble concurrent MEMS process

Suzuki, Tatsuya; Hara, Motoaki; Oguchi, Hiroyuki; Kuwano, Hiroki

doi:10.1109/memsys.2013.6474241

Cited by 3 publications

(2 citation statements)

References 7 publications

(9 reference statements)

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“…1. In the process, micro needle emitter array and a reservoir for the IL were fabricated with single photomask based on silicon bulk micromachining.…”

Section: Fabrication Of the Ilis Arraymentioning

confidence: 99%

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Concurrent reactive ion etching employing micromachined ionic liquid ion source array

Yoshida

Hara

Oguchi

et al. 2014

2014 IEEE 27th International Conference on Micro Electro Mechanical Systems (MEMS)

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This paper describes concurrent reactive ion etching using micro ionic liquid ion source (ILIS) array. The system consists of micro needle emitters and a reservoir for the ionic liquid (IL) of 1-ethyl-3-methylimidazolium tetrafluoroborate ([EMIM]-[BF 4 ]). The ion beam etching of a (100) silicon substrate using the fabricated ILIS array was demonstrated. As a result of mass spectroscopy during the etching, the peaks of SiF + , SiF 2 + , and SiF 3 + were observed. The chemical reaction between the silicon and fluorine based ions from the IL was confirmed. Also, etching rate of the silicon using the ILIS array applying 5.1 kV ion-acceleration voltage was calculated from the etched dimple on the substrate and was 1.5 times larger than that of a conventional focused Ga + ion beam applying 30 kV ion-acceleration voltage.

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“…1. In the process, micro needle emitter array and a reservoir for the IL were fabricated with single photomask based on silicon bulk micromachining.…”

Section: Fabrication Of the Ilis Arraymentioning

confidence: 99%

“…1 was proposed [1]. In the system, emitters, extractors and lenses are integrated in an array arrangement.…”

Section: Introductionmentioning

confidence: 99%