1988
DOI: 10.1016/0022-328x(88)89114-9
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IR laser photosensitized decomposition of 1-methyl-1-silacyclobutane. Efficient gas-phase polymer deposition

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Cited by 30 publications
(8 citation statements)
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“…We have reported on the formation of organosilicon polymers from the gas phase by the continuous-wave CO, laser-induced decomposition of 1-methyl-1-silacyclobutane [6] or 4-silaspiro(3.4)octane 171. Pulsed C 0 2 laser-induced multiphoton dissociation of silane in the presence of methyl methacrylate [l 11 has also been reported.…”
Section: Papouskova Et Almentioning
confidence: 99%
“…We have reported on the formation of organosilicon polymers from the gas phase by the continuous-wave CO, laser-induced decomposition of 1-methyl-1-silacyclobutane [6] or 4-silaspiro(3.4)octane 171. Pulsed C 0 2 laser-induced multiphoton dissociation of silane in the presence of methyl methacrylate [l 11 has also been reported.…”
Section: Papouskova Et Almentioning
confidence: 99%
“…The deposition of polymer thin films using light has been accomplished by photolyzing precursors in the gas phase above a substrate with pulsed lasers. An example of this is the photolysis of 1-methyl-1-silacyclobutane to form an organosilicon polymer (Pola et al 1988). The addition of SF 6 to the precursor gas was used as an "energy conveyer" to assist the energy transfer from the 10.6-m IR photons to the precursor.…”
Section: Iii-v Semiconductorsmentioning
confidence: 99%
“…The deposition of polymer thin films using light has been accomplished by photolyzing precursors in the g¥ phase above a substrate with pulsed lasers. An example of this is the photolysis of 1-methyl-1 -silacyclobutane to form an organosilicon polymer (Pola et al 1988). The addition of SF6 to the precursor gas was used as an "energy conveyer" to assist the energy transfer from the 10.6-J1 m IR photons to the precursor.…”
Section: -10mentioning
confidence: 99%