Infrared multiphoton decomposition of 2-chloroethenylsilane is dominated by dehydrochlorination and by decomposition of the intermediary ethynylsilane, and it affords a solid material consisting of an Si/C/H polymer and silicon carbide. The content of the latter can be increased by using a high-energy fluence of laser radiation.

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Chemical reactions induced by single-and two-wavelength CO, laser radiation in a mixture of silane and chlorodifluoromethane are initiated by the reaction between :CF, and SiH, and afford volatile carbonaceous products with C-H bonds, together with a solid deposit consisting of silicon carbide and highly reactive Si/C/H/F polymeric material. The results are in line with the reduction of the strong C-F bond of difluorocarbene and with the production of H,Si=CF, silene as intermediate which undergoes dehydrofluorination and polymerization. nhv SiH4ClFC-CF, ClFC: -HFC:In this paper we present results of our studies of the so far unaddressed infrared photochemistry of silane in SiH,-F,CHCl mixtures using irradiation with two different

Solid SiICIHIF materials laser-deposited from gaseous fluoro-methylsilanes are examined by XPS, SEM, IR and Raman spectroscopy and revealed to be a blend of silicon-carbon-based frameworks, possessing some Si-H and C-H bonds, and carbon whose modification is dependent on the structure of the parent fluoromethylsilane. Their properties are affected by contact with the atmosphere: although incorporation of oxygen into silicon-carbon frameworks is a very fast process, the dramatically improved adhesion to aluminium requires long exposure periods.