2013
DOI: 10.1364/ao.52.005949
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Iridium-coated micropore x-ray optics using dry etching of a silicon wafer and atomic layer deposition

Abstract: To enhance x-ray reflectivity of silicon micropore optics using dry etching of silicon (111) wafers, iridium coating is tested by use of atomic layer deposition. An iridium layer is successfully formed on sidewalls of tiny micropores with a pore width of 20 μm and depth of 300 μm. The film thickness is ∼20  nm. An enhanced x-ray reflectivity compared to that of silicon is confirmed at Ti Kα 4.51 keV, for what we believe to be the first time, with this type of optics. Some discrepancies from a theore… Show more

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Cited by 18 publications
(15 citation statements)
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“…We tested Ir ALD in the early stage of our development. 37 Although the coating was successful in terms of x-ray reflectivity, the cost was higher.…”
Section: Effective Areamentioning
confidence: 99%
“…We tested Ir ALD in the early stage of our development. 37 Although the coating was successful in terms of x-ray reflectivity, the cost was higher.…”
Section: Effective Areamentioning
confidence: 99%
“…36 We have tested Ir ALD in the early stage of our development. 37 Although the coating was successful in terms of X-ray reflectivity, the cost was higher. The Pt ALD process consists of two reactions.…”
Section: Effective Areamentioning
confidence: 99%
“…We coated the optic with Ir using a Beneq TFS 200 R&D ALD deposition tool with (ethylcyclopentadienyl) (1,5-cyclooctadiene) iridium, Ir (EtCp) (cod), and O 2 as precursors at 300 • C deposition temperature as described in Ogawa et al (2013). The Ir film thickness is 20 nm.…”
Section: Fabricationmentioning
confidence: 99%
“…When we consider the incorrect focal length and the angular error Table 6 Summary of raytracing simulations at 1.49 keV a The same h and σ rms are assumed for the first-and second-stage optics from the HPD values, the effective area increases to 110 mm 2 , which is larger than the ideal case because reflection angles can be smaller than the ideal case. Even when we consider the ridge structure that can geometrically shadow a part of incident photons as demonstrated in Ogawa et al (2013), the effective area is still 95 mm 2 . By adding the factor of the rms surface roughness on mirrors from the AFM measurement, the effective area is still 55 mm 2 .…”
Section: Effective Areamentioning
confidence: 99%