An investigation is made of the influence of the free electron and donor impurity concentrations on the annealing kinetics of the 36 and 66 "K stages and on the creation rate of the 36 OK stage, in low temperature electron irradiated n-type Germanium, using h-or Sb-doped samples, Ga and Cu compensated samples, and a Li-doped sample. The results obtained allow to conclude that the mobility of the Ge interstitial occurs at 4.6, 27, and 65 OK, depending on its charge state and the mobility of the vacancy at 90 OK, and to identify the defect associated with the 36 OK stage as a vacancy-interstitial pair where the interstitial is a donor impurity (annealing through the interstitial mobility). This interstitial mobility, strongly dependent on the charge state, explains radiation annealing and the behaviour of irradiated p-type Germanium.