1998
DOI: 10.1023/a:1021221204250
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Cited by 25 publications
(10 citation statements)
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“…PLD is a fast and versatile technique for fabricating a wide range of thin-film devices including waveguide lasers [87][88][89]. As shown in Fig. 14 the growth process is carried out in a vacuum chamber, where a pulsed laser beam is focused onto a solid target, thereby inducing material ablation.…”
Section: Pulsed Laser Deposition (Pld)mentioning
confidence: 99%
“…PLD is a fast and versatile technique for fabricating a wide range of thin-film devices including waveguide lasers [87][88][89]. As shown in Fig. 14 the growth process is carried out in a vacuum chamber, where a pulsed laser beam is focused onto a solid target, thereby inducing material ablation.…”
Section: Pulsed Laser Deposition (Pld)mentioning
confidence: 99%
“…Furthermore, pulsed laser deposition enables the transfer of the stoichiometry of the used target material to the substrate. By variation of the process parameters such as temperature and processing gas pressure amorphous, polycrystalline and crystalline thin films have been achieved [6,9].…”
Section: Introductionmentioning
confidence: 99%
“…The advantage of the method is a good control of the layer growing process by adjusting of wide set of technology parameters such as: the energy of laser beam, the substrate temperature, the pressure of ambient gas, etc. Thus the method is widely used for layer deposition not only of classical materials (metals, semiconductors) but also such specific compounds like high-temperature superconductors [11][12][13] new metal alloys [14][15][16][17], biocompatible coatings [18,19], laser crystals [20,21] and polymers [22]. The determination of the technology parameters of layer growth is realised either by the theoretical estimation or by in-situ monitoring during the layer deposition by RHEED [23].…”
Section: Introductionmentioning
confidence: 99%