Kinetic and Monte Carlo models of thin film coarsening: Cross over from diffusion-coalescence to Ostwald growth modes

Lo, Alan; Skodje, Rex T.

doi:10.1063/1.480756

Cited by 63 publications

(78 citation statements)

References 37 publications

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“…A mechanism that could potentially also play a role is Ostwald ripening. 43,44 This mechanism could possibly explain the TEM and AFM data, suggesting that the nucleation sites can develop faster for plasma-assisted ALD and that grains become larger at the expense of smaller grains. Ostwald ripening is known to be enhanced by higher energy fluxes 45,46 and the energy flux during plasma-assisted ALD is certainly higher than for thermal ALD.…”

Section: 2431mentioning

confidence: 97%

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

Leick

Verkuijlen

Lamagna

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers)Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. The metalorganic precursor cyclopentadienylethyl͑dicarbonyl͒ruthenium ͑CpRu͑CO͒ 2 Et͒ was used to develop an atomic layer deposition ͑ALD͒ process for ruthenium. O 2 gas and O 2 plasma were employed as reactants. For both processes, thermal and plasma-assisted ALD, a relatively high growth-per-cycle of ϳ1 Å was obtained. The Ru films were dense and polycrystalline, regardless of the reactant, yielding a resistivity of ϳ16 ⍀ cm. The O 2 plasma not only enhanced the Ru nucleation on the TiN substrates but also led to an increased roughness compared to thermal ALD.

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Section: 2431mentioning

confidence: 97%

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

Leick

Verkuijlen

Lamagna

et al. 2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

show abstract

“…49,[62][63][64][65][66][67][68][69][70][71][72][73][74][75][76][77][78][79] Coarsening is a ubiquitous phenomenon. The most common example involves the morphology of a miscible A-B system quenched in a two-phase region of the phase diagram.…”

Section: Dynamics Of Pattern Evolution: Late-stage Coarsening Of Dropmentioning

confidence: 99%

Wetting and dynamics of structured liquid films

Green

2003

J Polym Sci B Polym Phys

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ABSTRACT:The stability of a sufficiently thin, supported, homopolymer film against the development of local thickness fluctuations which can become amplified, eventually leading to structural destabilization of the film, is typically determined by long and short-range intermolecular forces. In A-B diblock copolymers, the connectivity between the blocks, the preferential attraction of one block to an external interface, combined with an incompatibility between the A-B segments, the situation is very different. Two cases, largely dictated by N, wher is the Flory-Huggins interaction parameter and N is the degree of polymerization, can arise in thin copolyme films. When N is large, thin films exhibit comparatively stable topographical structures, where the dimensions of the topographies normal to the substrate reflect a natural length-scale associated with phase separation in the material. In the other situation, where N is sufficiently small, the copolymer bulk structure is homogeneous. An ordered structure can be induced into the otherwise compositionally homogeneous structure in the vicinity of a substrate. Here, depending on film thickness, a series of transient and stable topographies can develop. Wetting, early stage structural destabilization dynamics leading to the formation of droplets, and late stage coarsening of the droplets are discussed.

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“…In closing, we point out that kinetic Monte Carlo models such as described in the foregoing have been extensively used to simulate vacancy aggregation in metals. 39,91 These models suffer from several limitations, most notably, the rigid lattice approximation, which neglects elastic interactions between vacancies; the simplified Ising Hamiltonian, which tends to break down for complex cluster geometries and at void surfaces; and limitations attendant to the use of harmonic transition-state theory. Because of these and other limitations, the results presented in this paper cannot be considered predictive and mainly provide a preliminary assessment as to the feasibility of nanovoid nucleation by vacancy aggregation at high tensile pressures and temperatures.…”

Section: Discussionmentioning

confidence: 99%

Nanovoid nucleation by vacancy aggregation and vacancy-cluster coarsening in high-purity metallic single crystals

2011

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A numerical model to estimate critical times required for nanovoid nucleation in high-purity aluminum single crystals subjected to shock loading is presented. We regard a nanovoid to be nucleated when it attains a size sufficient for subsequent growth by dislocation-mediated plasticity. Nucleation is assumed to proceed by means of diffusion-mediated vacancy aggregation and subsequent vacancy cluster coarsening. Nucleation times are computed by a combination of lattice kinetic Monte Carlo simulations and simple estimates of nanovoid cavitation pressures and vacancy concentrations. The domain of validity of the model is established by considering rate-limiting physical processes and theoretical strength limits. The computed nucleation times are compared to experiments suggesting that vacancy aggregation and cluster coarsening are feasible mechanisms of nanovoid nucleation in a specific subdomain of the pressure-strain rate-temperature space.

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Kinetic and Monte Carlo models of thin film coarsening: Cross over from diffusion-coalescence to Ostwald growth modes

Cited by 63 publications

References 37 publications

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

Atomic layer deposition of Ru from CpRu(CO)2Et using O2 gas and O2 plasma

Wetting and dynamics of structured liquid films

Nanovoid nucleation by vacancy aggregation and vacancy-cluster coarsening in high-purity metallic single crystals

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