Kinoform Optical Elements

Koronkevich, V. P.; Lenkova, G. A.; Mikhaltsova, I. A.; Remesnik, V. G.; Fateev, V.A.; Tsukerman, V. G.

doi:10.1007/978-1-4615-7542-9_9

Cited by 5 publications

(5 citation statements)

References 6 publications

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“…One problem perhaps is their low diffractive efficiency [11 , [4] . The multilevel phase approximation brings the properties closer to the theoretical maxima, but, on the other hand, difficulties of fabrication and complexity of design grow as wel 1 [8] . The more the diffractive elements are used the stronger the demands on realized phase function and on aperture extension become.…”

Section: Introductiq{mentioning

confidence: 96%

<title>Planar diffractive optical elements prepared by electron-beam lithography</title>

Urban

Matějka²

1991

SPIE Proceedings

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SUWRYThe paper presents results of research activities devoted to preparing optical diffraction elements for space waves by use of e lectron -beam 1 ithography .It is shown that the orthogonal electron beam drawing can give rising the irregularities and flaws. Relations between the zone area inaccuracy and properties of the relief binary phase transparent screens are described. From these relations, the demands for setting of the necessary edge drawing quality of the electron beam exposition is derived.

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Section: Introductiq{mentioning

confidence: 96%

<title>Planar diffractive optical elements prepared by electron-beam lithography</title>

Urban

Matějka²

1991

SPIE Proceedings

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“…The choice of exposure algorithms, technologies and materials for laser writing of precision computer-generated holograms (CGH) is largely determined by the design of the writing system used. Scanning laser lithographic systems (SLLS) described in the literature and used for the manufacturing the CGHs and micro-optical elements can be divided into two main groups: X-Y systems with a basic linear trajectory of the beam motion [ 1 , 2 , 3 ] and circular laser writing systems (CLWS) [ 4 , 5 , 6 , 7 , 8 , 9 , 10 ].…”

Section: Introductionmentioning

confidence: 99%

Diffractive Sensor Elements for Registration of Long-Term Instability at Writing of Computer-Generated Holograms

Shimansky

Belousov

Korolkov

et al. 2021

Sensors

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The research and development of methods using of the specialized diffractive microstructure sensors embedded in the pattern of computer-generated holograms (CGH) manufactured on circular and X-Y laser writing systems is discussed. These microstructures consist of two parts: one of which is written before the CGH in the field of future hologram and the second one is written during the long-term writing of the CGH. The shift between the first and second part of the microstructure is the trace of the writing errors and allows one to determine and calculate the error of CGH fabrication along both orthogonal coordinates. The developed method is based on the principle of diffraction-based overlay with 1D and 2D built-in diffractive microstructure-sensors. Mathematical modeling and results of experimental test writings of such diffractive microstructure sensors are described. The efficiency of using these types of build-in sensors for the writing errors estimation for CGHs is demonstrated.

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“…Direct laser writing (DLW) is a rapid manufacturing technology which was introduced in the 1980s during the development of large-scale integrated circuits. The initial applications were to use a laser beam to scan over a layer of photoresist material to produce a precision lens array or to make a mask on a photoresist-coated vulcanized glass-state semiconductor (CGS) [22,23]. The scanning accuracy that was achievable at that time was on the order of submicrons with a minimum line width of 1 μm [24].…”

Section: Introductionmentioning

confidence: 99%

Polymer-Based Device Fabrication and Applications Using Direct Laser Writing Technology

Yin

et al. 2019

Polymers

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Polymer materials exhibit unique properties in the fabrication of optical waveguide devices, electromagnetic devices, and bio-devices. Direct laser writing (DLW) technology is widely used for micro-structure fabrication due to its high processing precision, low cost, and no need for mask exposure. This paper reviews the latest research progresses of polymer-based micro/nano-devices fabricated using the DLW technique as well as their applications. In order to realize various device structures and functions, different manufacture parameters of DLW systems are adopted, which are also investigated in this work. The flexible use of the DLW process in various polymer-based microstructures, including optical, electronic, magnetic, and biomedical devices are reviewed together with their applications. In addition, polymer materials which are developed with unique properties for the use of DLW technology are also discussed.

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Kinoform Optical Elements

Cited by 5 publications

References 6 publications

<title>Planar diffractive optical elements prepared by electron-beam lithography</title>

<title>Planar diffractive optical elements prepared by electron-beam lithography</title>

Diffractive Sensor Elements for Registration of Long-Term Instability at Writing of Computer-Generated Holograms

Polymer-Based Device Fabrication and Applications Using Direct Laser Writing Technology

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