Kinoform X-ray lens creation in polymer materials by deep X-ray lithography

Nazmov, V.; Shabel'nikov, L.G.; Pantenburg, F. J.; Mohr, J.; Reznikova, E.; Snigirev, A.; Snigireva, I.; Kouznetsov, Sergey V.; DiMichiel, Marco

doi:10.1016/j.nimb.2003.11.002

Cited by 59 publications

(33 citation statements)

References 15 publications

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“…The holes of two resist blocks of the cross lens were obtained at the tilted exposure of the gold absorber structure of the working X-ray mask designed in the same form with R = 130 lm, A = 140 lm and the same widths of the structure and the bridge. The geometry of the tested kinoform lens was presented in [14,17]. The geometry accuracy of the tested SU-8 lens structures and the roughness of their side-wall surfaces were studied by SEM and optical microscopes as well as AFM and long scan profile measurements.…”

Section: Characteristics Of Su-8 Lens Structuresmentioning

confidence: 99%

“…In our previous works [13,14] it has been shown that microstructures with aspect ratios of more than 200 can be manufactured by deep X-ray lithography in SU-8 resist layers with thicknesses of up to 1 mm and that these 1 mm thick SU-8 polymer structures possess a high radiation stability. Therefore we first proposed SU-8 polymer as material for the formation of X-ray refractive lenses by means of deep X-ray lithography.…”

Section: Introductionmentioning

confidence: 99%

“…A X-ray mask with gold absorber of 20 lm minimal thickness on a 2.7 lm thick titanium membrane was used for the formation of SU-8 lenses with elements of cylindrical, round segment (Fig. 2) and kinoform [14] profile (Fig. 3).…”

Section: Introductionmentioning

confidence: 99%

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Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Nazmov

Reznikova

Mohr

et al. 2004

Microsystem Technologies

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Deep X-ray lithography processing of SU-8 negative resist layers with thicknesses of up to 1 mm and physical-chemical properties of SU-8 polymer structures were investigated to find the optimum conditions for the fabrication of X-ray refractive lenses. The exposure was carried out at the ANKA storage ring in Karlsuhe, Germany. Experimental tests of the lenses were performed at the ESRF in Grenoble, France. First lenses showed a gain in the range of 20, a full width at half maximum of the focal spot intensity of approximately 2 lm to 3 lm and unique radiation stability of the optical characteristics. IntroductionThe idea of refractive X-ray lenses proposed in [1] was for the first time realized in form of consecutive holes in an aluminum block [2]. Unlike in case of visible light such an X-ray lens has to be composed of several elements with a concave shape. Their radius of curvature is in the range of several hundreds down to tens of micrometers. The lens material is absorbing. Since the first publication search and development of suitable materials and technologies for the formation of this simplest and cheapest type of X-ray optics is going on [3][4][5][6][7][8][9].Materials consisting of light atoms allow to reduce X-ray absorption and to increase the gain in the focal spot of an X-ray lens compared to heavier materials. Minimizing the bridge distance between adjacent concave shapes of an element of an X-ray lens leads to the same result. Besides, the exact patterning of the lens element form with the possibility of a coaxial arrangement of the elements is necessary in order to obtain the minimal size of a focal spot. A high roughness of the surface of the lens elements and a crystallinity of the lens material needs also to be avoided because it reduces the gain in the focal spot. In addition, expensive and materials unstable under X-ray exposure under normal conditions can not be used for this application. Depending on these evident limitations, planar lithographic technologies, especially deep X-ray lithography and LIGA technique would be a suitable process to pattern these elements. Structure characteristics as aspect ratios up to 100, sub-micrometer tolerance, smooth side-walls, vertical and tilted structures, sub-micrometer precision and exact positioning of the structures on a substrate are achieved by deep X-ray lithography in thick resist layers [10]. In principle, polymer X-ray resist materials composed from C, O and H atoms mainly are from the point of absorption competitive against the known lens materials as Li, Be, diamond, Al and Si. However, positive X-ray resists like PMMA which is conventional for X-ray lithography are destroyed under X-ray exposure in case of an absorbed radiation of already 1 kJ/cm 3 . This is insufficient even for a 1 h monochromatic X-ray experiment.A while ago the multi-component highly sensitive negative photo-resist SU-8 [11] was firstly proposed for deep X-ray lithography [12]. In our previous works [13,14] it has been shown that microstructures with aspect ratios of m...

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Section: Characteristics Of Su-8 Lens Structuresmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Nazmov

Reznikova

Mohr

et al. 2004

Microsystem Technologies

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“…The over-depth uniformity of our lens was accomplished by the use of sacrificial structures. Notably, lenses manufactured by (rarely available) x-ray lithography of polymers, 62,63 multiprism lenses (approximating the ideal refracting profile by multiple wedges, made, e.g., by anisotropically wet etched silicon), 64 or Fresnel zone plates 65,66 are viable alternatives to silicon x-ray lenses made by DRIE. Our attempt to double the lens transmittance by a kinoform design failed due to our underestimation of the convergence of the beam inside the lens.…”

Section: Optical Performancementioning

confidence: 99%

Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses

Stöhr

Michael-Lindhard

Hübner

et al. 2015

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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O. (2015). Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses. Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures, 33(6), [062001]. DOI: 10.1116/1.4931622 Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses This article describes the realization of complex high-aspect ratio silicon structures with feature dimensions from 100 lm to 100 nm by deep reactive ion etching using the Bosch process. As the exact shape of the sidewall profiles can be crucial for the proper functioning of a device, the authors investigated how sacrificial structures in the form of guarding walls and pillars may be utilized to facilitate accurate control of the etch profile. Unlike other sacrificial structuring approaches, no silicon-on-insulator substrates or multiple lithography steps are required. In addition, the safe removal of the sacrificial structures was accomplished by thermal oxidation and subsequent selective wet etching. The effects of the dimensions and relative placement of sacrificial walls and pillars on the etching result were determined through systematic experiments. The authors applied this process for exact sidewall control in the manufacture of x-ray lenses that are very sensitive to sidewall shape nonuniformities. Compound kinoform lenses for focusing hard x-rays with structure heights of 200 lm were manufactured, and the lenses were tested in terms of their focusing ability and refracting qualities using synchrotron radiation at a photon energy of 17 keV. A 180 lm long line focus with a waist of 430 nm at a focal length of 215 mm was obtained.

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“…CRL are being used to generate micron or below size beam at third generation synchrotron facilities. Various types of materials are reported for CRLs fabrication and testing, some of materials are silicon [1] Nickel [2], Beryllium [3] Lithium [4], SU-8 [5] and PMMA [6] etc.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of compound refractive lens using soft and deep X-ray lithography beamline on Indus-2

Dhamgaye¹,

Lodha²

2012

AIP Conference Proceedings

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X-ray compound refractive lenses (CRL) have been fabricated using Soft and Deep X-ray lithography (SDXRL) beamline on Indus-2. Upto 50 parabolic lenses are fabricated in PMMA using 1X X-ray mask. The mask contains of 20 micron thick gold absorbing pattern on polyimide membrane. The lens fabrication is done by exposing 500 m thick PMMA sheets to 5-12keV X-rays from Indus-2. The fabricated CRL will be suitable for generating focused X-ray beam of Indus-2 bending magnet source.

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Kinoform X-ray lens creation in polymer materials by deep X-ray lithography

Cited by 59 publications

References 15 publications

Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Sacrificial structures for deep reactive ion etching of high-aspect ratio kinoform silicon x-ray lenses

Fabrication of compound refractive lens using soft and deep X-ray lithography beamline on Indus-2

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