2019
DOI: 10.1016/j.nimb.2019.05.053
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Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

Abstract: Proton-induced X-ray emission (PIXE) combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. With the help of an energy dispersive X-ray camera, the intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured. It is found that an interfacial compound is formed in Pt… Show more

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Cited by 4 publications
(8 citation statements)
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“…[ 46,69,70 ] The GEXRF scheme has also been applied to PIXE setups to enable depth‐discrimination properties for the analysis of thin films and multilayers. [ 48,69,71 ] A possible advantage of using protons for fluorescence excitation with respect to quantification is the fluorescence generation function, which can typically be assumed constant within the information depth. [ 48,71 ]…”
Section: Gexrf Instrumentationmentioning
confidence: 99%
See 2 more Smart Citations
“…[ 46,69,70 ] The GEXRF scheme has also been applied to PIXE setups to enable depth‐discrimination properties for the analysis of thin films and multilayers. [ 48,69,71 ] A possible advantage of using protons for fluorescence excitation with respect to quantification is the fluorescence generation function, which can typically be assumed constant within the information depth. [ 48,71 ]…”
Section: Gexrf Instrumentationmentioning
confidence: 99%
“…[ 48,69,71 ] A possible advantage of using protons for fluorescence excitation with respect to quantification is the fluorescence generation function, which can typically be assumed constant within the information depth. [ 48,71 ]…”
Section: Gexrf Instrumentationmentioning
confidence: 99%
See 1 more Smart Citation
“…This work demonstrated the ability of the PIXE‐Kossel methodology to characterize the stacks of nano‐scale thin films, through the analysis of two waveguide systems: namely Pt/Fe/Pt and Ta/Cr/Pt. However, the analysis of the Ta/Cr/Pt system was not definitive, as the obtained description of the stack, that is, intermixing taking place between the Ta and Cr layers to form a compound that was subsequently partly oxidized, could still be improved 14 …”
Section: Introductionmentioning
confidence: 99%
“…[9][10][11][12] In this framework, we showed the feasibility of applying Kossel diffraction 13 combined with particle induced x-ray emission (PIXE) for the study of planar x-ray waveguides. 14 These devices are made of thin films, a guiding layer generally made of a light material surrounded by two cladding layers made of heavy materials. This work demonstrated the ability of the PIXE-Kossel methodology to characterize the stacks of nano-scale thin films, through the analysis of two waveguide systems: namely Pt/Fe/Pt and Ta/Cr/Pt.…”
Section: Introductionmentioning
confidence: 99%