Large area flux transformers and passivation for flip-chip magnetometers

Francke, C.; Mex, L.; Meyer, B.; Müller, Jörg

doi:10.1109/77.621811

Cited by 5 publications

(3 citation statements)

References 3 publications

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“…In wet processes is used for volatile derivativation of a large variety of biological compounds [1][2][3][4] or surface silylation [5][6][7][8] in microelectronic applications, and for surface preparation of the chromatographic capillary columns 9 . In dry processes is normally used for plasma processing in microelectronic, for several applications, such as surface protection 10,11 and optics [12][13][14] .…”

Section: Introductionmentioning

confidence: 99%

Hydrophobic plasma polymerized hexamethyldisilazane thin films: characterization and uses

Carvalho

Silva

et al. 2006

Mat. Res.

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Hexametildisilazane (HMDS) plasma polymerized thin films obtained using low frequency power supplies can be used to make adsorbent films and turn surfaces hydrophobic. The aim of this work was to verify the hydrophobicity and adsorption properties of HMDS thin films (with and without the addition of oxygen, resulting in double or single layer films) obtained using an inductive reactor powered with a 13.56 MHz power supply. Single and double layer thin films were deposited on silicon for film characterization, polypropylene (PP) for ultraviolet (UVA/UVC) resistance tests, piezoelectric quartz crystal for adsorption tests. The double layer (intermixing) of HMDS plasma polymerized films and HMDS plasma oxidized surfaces showed a non-continuous layer. The films showed good adhesion to all substrates. Infrared analysis showed the presence of CHn, SiCH3, SiNSi and SiCH2Si within the films. Contact angle measurements with water showed hydrophobic surfaces. UVA/UVC exposure of the films resulted in the presence of cross-linking on carbonic radicals and SiCH2Si formation, which resulted in a possible protection of PP against UVA/UVC for a duration of up to two weeks. Adsorption tests showed that all organic reactants were adsorbed but not water. Plasma etching (PE) using O2 showed that even after 15 minutes of exposure the films do not change their hydrophobic characteristic but were oxidized. The results point out that HMDS films can be used: for ultraviolet protection of flexible organic substrates, such as PP, for sensor and/or preconcentrator development, due to their adsorption properties, and in spatial applications due to resistance for O2 attack in hostile conditions, such as plasma etching

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Section: Introductionmentioning

confidence: 99%

Hydrophobic plasma polymerized hexamethyldisilazane thin films: characterization and uses

Carvalho

Silva

et al. 2006

Mat. Res.

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“…Typical T C of YBCO films and structures are 86 K. Patterning is performed by standard photolithography and Ar-ion beam etching. Details of the deposition conditions, the patterning process and the properties of the YBCO devices have been described elsewhere [21,22].…”

Section: Methodsmentioning

confidence: 99%

Plasmapolymerized hexamethyldisilasane for the passivation of devices

Mex¹,

Francke²,

Müller³

1998

Supercond. Sci. Technol.

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Electronic devices based on the high-temperature superconductor (YBCO) may deteriorate in the operating environment under the influence of moisture, atmospheric carbon dioxide and frequent thermal cycling. To avoid these impairments a passivation layer was developed which is deposited by polymerization of the silicon organic compound hexamethyldisilasane (HMDS-N) in a plasma enhanced chemical vapour deposition (PECVD) process. The 100 nm thin films exhibit excellent passivation properties which is confirmed by electrical transport measurements of passivated wide and 100 nm high YBCO lines and step edge Josephson junctions exposed to humidity and . No degradation in the critical parameters such as the critical current , the normal resistance and the flux-voltage modulation depth is observed on step edge dc-SQUIDs owing to the deposition of the passivation layer. Atomic force microscope (AFM) measurements show a smooth morphology of these layers without pinholes and an excellent coverage of the YBCO even at the edges of lines. Furthermore, the passivation layer can be used as an isolation and scratch protection between SQUIDs and thin-film flux transformers in flip-chip magnetometers.

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“…Dentre as propriedades mais utilizadas deste material está seu caráter hidrofóbico, que favorece a proteção de superfícies (MEX, 1998;FRANCKE, 1997), e as propriedades ópticas dos filmes produzidos LEE d , 2001;JOHNSON, 2001). Para proteção de superfícies, normalmente deseja-se filmes com pouca presença de radicais carbônicos, fator responsável pelo caráter hidrofóbico (D'AGOSTINO a , 1990;LIM, 2005;OHGISHI, 2003).…”

Section: Processos Por Plasma E Polimerização Por Plasmaunclassified

Produção de filmes compósitos a partir de tetraetilortossilicato para aplicação em estruturas miniaturizadas e em detecção de VOCs/umidade.

Hernandez¹

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Large area flux transformers and passivation for flip-chip magnetometers

Cited by 5 publications

References 3 publications

Hydrophobic plasma polymerized hexamethyldisilazane thin films: characterization and uses

Hydrophobic plasma polymerized hexamethyldisilazane thin films: characterization and uses

Plasmapolymerized hexamethyldisilasane for the passivation of devices

Produção de filmes compósitos a partir de tetraetilortossilicato para aplicação em estruturas miniaturizadas e em detecção de VOCs/umidade.

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