Large-area ion source combining microwaves with inductively coupled plasma

Okuji, S.; Sakudo, N.; Hayashi, Keiji; Okada, Morihiro; Onogawa, T.; Maesaka, T.; Nishiyama, Yukio; Toyoda, Kenji; Yashima, S; Ishida, Tetsuro

doi:10.1063/1.1150271

Cited by 2 publications

(1 citation statement)

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“…Thus moderate ion beam (IB) energy and current density (10 eV-60 keV, ∼2 mA cm −2 ) [20,21] are sufficient to modulate or even sustain the LTPs. Various ion sources can be used for these applications, such as Kaufman ion source [22], end-Hall ion source [23], anode layer linear ion source [24] et al indeed, the plasma can be alone produced by the energetic beam of ions along as reported by Herrmann and Fessenden [25] decades ago. They show that the plasma can be sustained with only hydrogen ion injection into the discharge region.…”

Section: Introductionmentioning

confidence: 99%

Numerical characterization of capacitively coupled plasmas modulated by ion beam injection

Zhou¹,

Wang²,

Wu³

et al. 2022

Plasma Sources Sci. Technol.

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This work proposes to use the Ar+ ion beam (IB) injection to modulate the properties of the single-frequency capacitively coupled plasma (CCP). The particle-in-cell/Monte Carlo collisions (PIC/MCC) method is used to simulate the plasma characteristics after the IB (2 keV, 0.5A) is injected into the discharge area from the grounded electrode. The results show that the IB can effectively increase the plasma density, reduce the electron energy, increase the self-bias voltage, and thus increase ion flux and broaden the ion energy distribution function on the electrode. Furthermore, transition from $\alpha$-mode to $\gamma$-mode occurs by increasing the secondary electron emission coefficient γ and discharge pressure. In general, the IB injection can be used as a complementary tool to control the plasma properties of CCP.

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