2013
DOI: 10.1021/nn4009559
|View full text |Cite
|
Sign up to set email alerts
|

Large Area Metal Nanowire Arrays with Tunable Sub-20 nm Nanogaps

Abstract: We report a new top-down nanofabrication technology to realize large area metal nanowire (m-NW) arrays with tunable sub-20 nm separation nanogaps without the use of chemical etching or milling of the metal layer. The m-NW array nanofabrication technology is based on a self-regulating metal deposition process that is facilitated by closely spaced and isolated heterogeneous template surfaces that confine the metal deposition into two dimensions, and therefore, electrically isolated parallel arrays of m-NW can be… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

3
46
1

Year Published

2014
2014
2023
2023

Publication Types

Select...
6
1

Relationship

1
6

Authors

Journals

citations
Cited by 45 publications
(50 citation statements)
references
References 58 publications
3
46
1
Order By: Relevance
“…We notice that the higher the enhancement factor, the more the angle β approaches γ . This is consistent with the observations on macroscopic arrays of metal nanowires [37].…”
Section: Discussionsupporting
confidence: 93%
See 3 more Smart Citations
“…We notice that the higher the enhancement factor, the more the angle β approaches γ . This is consistent with the observations on macroscopic arrays of metal nanowires [37].…”
Section: Discussionsupporting
confidence: 93%
“…The authors also show that the resonating wavelength increases when the gap is decreased, while the resonance width decreases for larger strip width. We notice that for a nominal gap width of 20 nm, the actual one is roughly 30 nm [38], similar to the actual gap of our metal strips. Therefore, we expect to observe in our antennas a strong SPP coupling around λ L = 633 nm.…”
Section: Resultssupporting
confidence: 78%
See 2 more Smart Citations
“…With this technique, structures such as nanogroove, nanopyramid, and nanogap–nanowire arrays have been recently realized with tunable gap spacing and high spatially averaged analytical enhancement factors (AEF), 44 as shown in Figure 2. 45,46 Since in the first two of these approaches LIL is used in combination with anisotropic (100) silicon etching to create nanometer pitches and spacing, no mask is needed and the method is therefore relatively cheap. However, a disadvantage of these anisotropically etched structures is that the SERS hot spots with high signal enhancement occur only at a very small percentage of the surface area because the groove width and spacing between the pyramid sidewalls vary strongly.…”
mentioning
confidence: 99%