Light-hole tunnelling to the surface states is studied using photoluminescence (PL) spectroscopy and transient reflectivity measurements in the tensile-strained GaAsP/AlGaAs near-surface quantum well (NSQW) samples by reducing the top barrier layer thickness from 275 to 5 nm. The ground state transition (e 1 -lh 1 ) remains excitonic even at room temperature (RT) for a buried quantum well sample with 275 nm thick top barrier. When the top barrier thickness is reduced to 50 nm the same transition is found to be excitonic only at low temperatures but changes to free-carrier recombination at higher temperatures. When the top barrier layer thickness is further reduced to 5 nm, the ground state transition is no longer excitonic in nature, where it shows free-carrier behaviour even at 10 K. We therefore find a clear relationship between the character of the ground state transition and the top barrier layer thickness. Light-hole excitons cannot be formed in NSQW samples when the top barrier layer thickness is kept reasonably low. This is attributed to the quantum mechanical tunnelling of free light holes to the surface states, which is found to be faster than the exciton formation process. A tunnelling time of ∼500 fs for light holes is measured by the transient reflectivity measurements for the NSQW sample with a 5 nm top barrier. On the other hand, heavy-hole-related transitions in NSQW samples are found to be of excitonic nature even at RT because of the relatively large tunnelling time. It supports the dominance of excited state feature over the ground state transition in PL measurements at temperatures higher than 150 K.