Large-Scale Soft-Lithographic Patterning of Plasmonic Nanoparticles

Chiang, Naihao; Scarabelli, Leonardo; Vinnacombe‐Willson, Gail A.; Pérez, Luis Alberto; Dore, Camilla; Mihi, Agustín; Jonas, Steven J.; Weiss, Paul S.

doi:10.1021/acsmaterialslett.0c00535

Cited by 14 publications

(23 citation statements)

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“…After 1 min of growth, the average particle size reaches 40 ± 14 nm (Figure 3E), which is relatively fast compared to colloidal synthesis. [ 24,67,68 ] At 2 min, the products nearly double in size to 70 ± 30 nm (Figure 3F). Growth times of 5 and 10 min result in nanoparticles with similar diameters (120 ± 40 and 110 ± 40 nm, respectively, Figure 3G,H).…”

Section: Resultsmentioning

confidence: 99%

“…For instance, liters‐scale batch pre‐synthesis requires precise temperature and additional rate control and ligand exchange requires the addition of large excesses of capping ligands and multiple centrifugation steps. [ 18,22–24 ] Furthermore, the requirement of clean‐room facilities, costly specialized equipment, and complex self‐assembly steps present barriers preventing accessibility of plasmonic substrates. [ 25–27 ]…”

Section: Introductionmentioning

confidence: 99%

“…For instance, liters-scale batch presynthesis requires precise temperature and additional rate control and ligand exchange requires the addition of large excesses of capping ligands and multiple centrifugation steps. [18,[22][23][24] Furthermore, the requirement of clean-room facilities, costly specialized equipment, and complex self-assembly steps present barriers preventing accessibility of plasmonic substrates. [25][26][27] In situ growth is an unconventional approach where plasmonic structures are formed starting from inorganic precursors directly on the target substrate material without any initial colloidal synthesis steps.…”

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confidence: 99%

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Surface Lattice Plasmon Resonances by Direct In Situ Substrate Growth of Gold Nanoparticles in Ordered Arrays

et al. 2022

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frequencies of light depending on the nanoparticle size, shape, material, and local dielectric environment. [1] This localized surface plasmon resonance (LSPR) effect can confine light in subwavelength volumes, [2] resulting in the generation of an enhanced electric field. However, these resonances are typically short lived, due to intrinsic high radiative optical losses that limit the associated quality factors (<10). [3] Nonetheless, arranging plasmonic nanoparticles into ordered arrays emerged as a convenient strategy to overcome this limitation and to boost the quality factors of the system. In this configuration the optical losses associated with LSPRs can be compensated under Bragg conditions by hybridization with the scattered waves in the plane of the array close to the position of the Rayleigh-Wood anomalies. [3] This compensation generates lattice plasmon resonances, and offers an additional possibility for tuning the optical properties, depending on the angle of illumination and the geometrical parameters of the array. [3] Due to their narrow bandwidth (<2 nm) and long lifetimes, [3][4][5] lattice plasmon resonances already impact the enhancement and manipulation of light-matter interactions, [6][7][8] sensing, [9][10][11][12] displays, [13] information storage [14] and anti-reflective materials. [15] The development of a simple, scalable, and rapid technique that combines the benefits of top-down and bottom-up methods Precise arrangements of plasmonic nanoparticles on substrates are important for designing optoelectronics, sensors and metamaterials with rational electronic, optical and magnetic properties. Bottom-up synthesis offers unmatched control over morphology and optical response of individual plasmonic building blocks. Usually, the incorporation of nanoparticles made by bottom-up wet chemistry starts from batch synthesis of colloids, which requires time-consuming and hard-to-scale steps like ligand exchange and self-assembly. Herein, an unconventional bottom-up wet-chemical synthetic approach for producing gold nanoparticle ordered arrays is developed. Water-processable hydroxypropyl cellulose stencils facilitate the patterning of a reductant chemical ink on which nanoparticle growth selectively occurs. Arrays exhibiting lattice plasmon resonances in the visible region and near infrared (quality factors of >20) are produced following a rapid synthetic step (<10 min), all without cleanroom fabrication, specialized equipment, or selfassembly, constituting a major step forward in establishing in situ growth approaches. Further, the technical capabilities of this method through modulation of the particle size, shape, and array spacings directly on the substrate are demonstrated. Ultimately, establishing a fundamental understanding of in situ growth has the potential to inform the fabrication of plasmonic materials; opening the door for in situ growth fabrication of waveguides, lasing platforms, and plasmonic sensors.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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confidence: 99%

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Surface Lattice Plasmon Resonances by Direct In Situ Substrate Growth of Gold Nanoparticles in Ordered Arrays

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“…utilizing different assembled and backfilled species [28,29]. and further substrate processing, e.g., pattern transfer to the underlying material layer [30][31][32][33][34][35][36]. In practice, CLL allows simple and facile fabrication of nanoscale surface patterns, whereas conventional photolithography methods are limited by diffraction during the illumination step and under/overetching during the development process [17].…”

Section: Introductionmentioning

confidence: 99%

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

Wang¹,

Chan²,

Liao³

et al. 2023

Beilstein J. Nanotechnol.

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We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest achieved feature dimension is 5 nm using a micrometer-scale structured stamp in a chemical lift-off lithography (CLL) process. Molecular patterns retained in the gaps between stamp features and their circumscribed or inscribed circles follow mathematical predictions, and their sizes can be tuned by altering the stamp structure dimensions, including height, pitch, and shape. These generated surface molecular patterns can function as biorecognition arrays or be transferred to the underneath Au layer for metallic structure creation. By combining CLL process with this gap phenomenon, soft material properties that are previously thought as demerits can be used to achieve sub-10 nm features in a straightforward sketch.

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“…Nanostructures with different shapes and functions have attracted extensive attention in a wide range of applications, such as sensors, [ 1,2 ] superwettability, [ 3 ] metamaterials, [ 4,5 ] and electrical devices. [ 6–8 ] Electron beam lithography (EBL), [ 9,10 ] focused ion beam (FIB) lithography, [ 11,12 ] photolithography, [ 13 ] and nanoimprinting [ 14,15 ] are the most common techniques for nanostructure fabrication. EBL and FIB are capable of controlling the morphology, size, and spacing at nanoscale, but high‐cost and low‐throughput.…”

Section: Introductionmentioning

confidence: 99%

In Situ Chemical Patterning Technique

Guan

Wang

et al. 2021

Adv Funct Materials

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Plasmonic nanochemistry is employed to develop a chemical patterning technique for multiscale distributed plasmonic nanoparticle (NP) arrays by a spatial confined in situ growth process. Ag NPs grow exclusively following the maximum plasmonic field areas of Au nanohole arrays under light illumination, and Ag NP‐assembly arrays (NAAs) with controllable morphology from nanoring to nanodisk are realized precisely. Combining with conventional photolithography, letters, and patterns ranging from macroscopic to sub‐microscale are accurately obtained. The region‐specific generated Ag NAAs acted as an excellent surface‐enhanced Raman scattering substrate to realize quantitative detection and Raman imaging, which are further applied to multilevel encryption applications. Moreover, the lithography strategy shows good universality where it can be utilized to fabricate Au NAAs and polypyrrole nanodisks, and applied on flexible polydimethylsiloxane and curved glass substrates. Overall, this lithography strategy has good general applicability to obtain a multiscale engineered large‐area array of colloidal metallic NPs and organic polymers without the presence of either heat or specific adhesive layers, thus offers an approach to plasmonic engineering for a myriad of applications ranging from plasmonic anti‐counterfeit labels to electrical devices.

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Large-Scale Soft-Lithographic Patterning of Plasmonic Nanoparticles

Cited by 14 publications

References 50 publications

Surface Lattice Plasmon Resonances by Direct In Situ Substrate Growth of Gold Nanoparticles in Ordered Arrays

Surface Lattice Plasmon Resonances by Direct In Situ Substrate Growth of Gold Nanoparticles in Ordered Arrays

Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

In Situ Chemical Patterning Technique

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