Since the first discovery of graphene, 2D materials are drawing tremendous attention due to their atomic thickness and superior properties. Fabrication of high-quality micro-/nanopatterns of 2D materials is essential for their applications in both nanoelectronics and nanophotonics. In this work, an all-optical lithographic technique, optothermoplasmonic nanolithography (OTNL), is developed to achieve high-throughput, versatile, and maskless patterning of different atomic layers. Low-power (≈5 mW µm −2 ) and high-resolution patterning of both graphene and MoS 2 monolayers is demonstrated through exploiting thermal oxidation and sublimation at the highly localized thermoplasmonic hotspots. Density functional theory simulations reveal that Au nanoparticles reduce the formation energy (≈0.6 eV) of C monovacancies through bonding between undercoordinated C and Au, leading to a significant Au-catalyzed graphene oxidation and a reduction of the required laser operation power. Programmable patterning of 2D materials into complex and large-scale nanostructures is further demonstrated. With its low-power, high-resolution, and versatile patterning capability, OTNL offers the possibility to scale up the fabrication of nanostructured 2D materials for many applications in photonic and electronic devices.