“…To gain abundant adsorption sites on the surface of C 3 N 4 , plasma surface modification should have great potential; this is an attractive technique that modifies and improves the surface properties of organic polymers by forming functional groups (e.g., hydroxyl, carboxyl, and amino functional groups). − One noticeable advantage of plasma is its nonequilibrium reaction field; that is, a high electron temperature in the 1–10 eV range can provide reactive radical species while keeping the ambient temperature low (≤room temperature). , The plasma-modified surface can enhance the affinity with other targeted molecules. , However, reports on the plasma treatments of C 3 N 4 − and other organic molecules as photocatalysts have thus far not reported the improvement of the adsorptivity of photocatalyst molecules on organic semiconductors in hybrid photocatalysts. In previous reports on the plasma surface modification of C 3 N 4 , plasmas were generated in the gas phase (typically Ar gas was used), with O 2 , N 2 , or NH 3 used as feeding gases to introduce oxygen- or nitrogen-containing functional groups and/or surface defect sites on C 3 N 4 , − resulting in the direct modification of the C 3 N 4 surface.…”