Laser direct writing using submicron-diameter fibers

Abstract

In this paper, a novel direct writing technique using submicron-diameter fibers is presented. The submicron-diameter fiber probe serves as a tightly confined point source and it adopts micro touch mode in the process of writing. The energy distribution of direct writing model is analyzed by Three-Dimension Finite-Difference Time-Domain method. Experiments demonstrate that submicron-diameter fiber direct writing has some advantages: simple process, 350-nm-resolution (lower than 442-nm-wavelength), large writing area, and controllable width of lines. In addition, by altering writing direction of lines, complex submicron patterns can be fabricated.

Optical microfiber passive components

“…Possible applications of such small spot size sources include SNOM, optical recording, photolithography and biosensing. Indeed, uncoated tips have already been used to demonstrate subwavelength direct writing in photoresist, but line widths have been limited to 350–380 nm, depending on the processing wavelength. OM arrays have also been proposed for far‐field subwavelength focusing down to a spotsize of λ.…”

Plasmonic Nanolithography: A Review

“…Considering the aforementioned disadvantages, more and more attention is paid to directwriting lithography which is more flexible and can be used to fabricate arbitrary patterns. Scanning probe lithography [72][73][74][75][76][77] is an important lithography technique belonging to direct writing lithography. The critical component of scanning probe lithography is the scanning probe [78], which is used to transmit light toward the tip of a tapered plasmonic waveguide to expose the resist [79].…”

Advanced optical methods for patterning of photonic structures in photoresist, III-V semiconductors and PMMA

“…Also there is no need for mask preparation as in photolithography, and the patterning can be performed in air. On the other hand, as the interaction between the optical near-field and the sample surface is a photochemical process, conventional materials used in far-field optical lithography, for example photoresists, can be used 13,14,16 .…”

“…PhC structures for integrated optics and optoelectronics can be fabricated by different lithography techniques as interference lithography [1][2][3][4][5][6] , ion and electron beam lithography 7,8 , nanoimprint lithography [9][10][11] , and near-field scanning optical microscope lithography [12][13][14][15][16] . Optical techniques presented in this paper allow maskless definition of planar microstructures.…”

“…These photonic structures patterned in thin photoresist layer can be employed as a mask for patterning of III-V semiconductor surfaces, what may be attractive for photonic applications in optoelectronic as waveguides [17][18][19] , lasers 20, 21 and light emitting diodes 22-25 . However, due to the diffraction limit, it is very difficult for the interference lithography to reach the subwavelength resolution. The subwavelength resolution can be provided by submicron-diameter optical fiber, where the metal coated fiber tip is used as a subwavelength fiber probe for a local exposure [14][15][16] . A combination of such fiber probe with a nanoposition system can be used as the near-field scanning optical microscope lithography (NSOM) with high exposure resolution.…”