“…2.2, when femtosecond laser radiation is applied in transparent bulk dielectric material with relatively lower intensity, the etching rate for several materials would be modified due to laser radiation-induced photochemical reactions or radiation-induced structure changes. Thus, internal microstructures are able to be fabricated inside photosensitive glasses [41,[118][119][120], fused silica glass [34,52,[121][122][123][124], sapphire crystal [30,125], semiconductors [126], porous glass [35,127,128], and polymer materials [129] by a selective etching method.…”