Laser-induced chemical vapor deposition of metals for microelectronics technology

Baum, Thomas H.; Comita, Paul B.

doi:10.1016/0040-6090(92)90907-s

Cited by 64 publications

(29 citation statements)

References 118 publications

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“…[72][73][74] Two rhodium carbonyl complexes (rhodium carbonyl chloride, Rh 2 Cl 2 (CO) 4 and rhodium carbonyl acetylacetonate, (acac)Rh(CO) 2 ) and one rhodium allyl complex, (Rh(allyl) 3 ), provided high thermal stability for this task in helium and helium/hydrogen atmospheres. These complexes reached vapor pressures from 6.7 to 10.8 Pa at 313-328 K. The catalysts prepared by CVD render good catalytic activities in the hydrogenation of alkenes and benzene.…”

Section: Carbonyl Rhodium Complexesmentioning

confidence: 99%

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Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

2003

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This article reviews the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals. In the course of the last decade the number of articles on CVD of this group of metals has increased significantly. A wide variety of metal organic complexes have been investigated as potential precursors and appreciable results have been obtained. However, some aspects such as low deposition rates and impurity incorporation into the films still remain as concerns in this area. The representative results on CVD of these metals are presented according to the type of metal organic complexes used.

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Section: Carbonyl Rhodium Complexesmentioning

confidence: 99%

“…[1][2][3][4] The potentiality of applications is due to the valuable combination of the intrinsic properties of these metals, including high thermal/ chemical stability, high electrical conductivity and catalytic activity. Thick enough coatings of fully dense morphology are essential to offer an effective corrosion/oxidation protection.…”

Section: Introductionmentioning

confidence: 99%

Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium

2003

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“…Gold nanomaterials have important applications in optical devices [1][2][3], solar cells [4], and for nano and microelectronics [5][6][7][8]. Other applications include use gold nanoparticles as catalytic systems for epoxidation of propylene, and CO oxidation at low temperature when deposited with high dispersion on the surface of TiO 2 , Fe 2 O 3 , and Al 2 O 3 [9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

Synthesis, crystal structure and thermal behavior of dimethylgold(III) derivatives of salicylaldimine Schiff bases – Novel precursors for gold MOCVD applications

Bessonov

Морозова

Gelfond

et al. 2008

Journal of Organometallic Chemistry

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“…LCVD is a method with which direct writing of fine metal patterns can be achieved on various substrates and has been applied to the repair of electrical circuits or photolithographic mask patterns and also to the fabrication of three-dimensional micro-structures [2][3][4][5][6]. There exist two different types of LCVD, which are pyrolytic LCVD and photolytic LCVD.…”

Section: Introductionmentioning

confidence: 99%