Laser-induced deposition of tungsten from tungsten hexachloride

“…In addition to the red‐shift in the spectrum, the coloration from higher interference orders appears with increasing exposure time, following the calculations based on thin‐film interference theory [ 26 ] (Figure S3, Supporting Information). Atomic force microscopy (AFM) measurements of the iron oxide microstructure further confirm the remarkably smooth surface profile (Figure 2b) compared to other laser‐induced chemical vapor deposition methods, [ 27,28 ] which is expected to support facile integration of the corresponding structure into other optoelectronic devices. The height of the iron oxide layer changes from ≈80 to ≈200 nm to cover the full visible spectrum (Figure 2b inset); however, this range can be further reduced by altering the precursor solution.…”

Section: Resultsmentioning

confidence: 67%

Digital Laser Micropainting for Reprogrammable Optoelectronic Applications

Lee

Kwon

Lim

et al. 2020

Adv Funct Materials

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Structural coloration is closely related to the progress of innovative optoelectronic applications, but the absence of direct, on‐demand, and rewritable coloration schemes has impeded advances in the relevant area, particularly including the development of customized, reprogrammable optoelectronic devices. To overcome these limitations, a digital laser micropainting technique, based on controlled thin‐film interference, is proposed through direct growth of the absorbing metal oxide layer on a metallic reflector in the solution environment via a laser. A continuous‐wave laser simultaneously performs two functions—a photothermal reaction for site‐selective metal oxide layer growth and in situ real‐time monitoring of its thickness—while the reflection spectrum is tuned in a broad visible spectrum according to the laser fluence. The scalability and controllability of the proposed scheme is verified by laser‐printed painting, while altering the thickness via supplementary irradiation of the identical laser in the homogeneous and heterogeneous solutions facilitates the modification of the original coloration. Finally, the proof‐of‐concept bolometer device verifies that specific wavelength‐dependent photoresponsivity can be assigned, erased, and reassigned by the successive application of the proposed digital laser micropainting technique, which substantiates its potential to offer a new route for reprogrammable optoelectronic applications.

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“…Here, T th characterizes the threshold temperature at which deposition starts, 23 ␦T th defines the sharpness of this threshold, T a is the Arrhenius activation temperature, and W 0 the corresponding preexponential factor. The main features of deposition with constant absorptivity are the following: The temperature near the position of the laser beam increases with the scanning velocity, due to the decrease in the cross section of the stripe, which is a good heat conductor.…”

Section: ͑31͒mentioning

confidence: 99%

Modeling of pyrolytic laser direct writing: Noncoherent structures and instabilities

Arnold

Kargl

Bäuerle

1997

Journal of Applied Physics

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Fabrication of a low-operating voltage diamond thin film metal-semiconductor-metal photodetector by laser writing lithography Three-dimensional simulations of pyrolytic laser direct writing from gas-phase precursors are presented. They are based on a fast method for the calculation of temperature distributions induced by an energy beam in deposits of arbitrary shape. Analytical approximations, fast Fourier transform, and the multigrid technique are combined in the algorithm. Temperature dependences of the absorptivities and heat conductivities of the deposit and the substrate have been taken into account. Self-consistent modeling of the growth process allows one to explain oscillations in the height and width of lines caused by the feedback between the shape of the deposit, the temperature distribution, and the growth rate. For the deposition of W from an admixture of WCl 6 ϩH 2 and a-SiO 2 substrates, the oscillations originate from a sharp increase in the absorptivity of the deposit with temperature. With the deposition of Si from SiH 4 , or C from CH 4 , C 2 H 2 , and C 2 H 4 , onto a-SiO 2 , the oscillations are related to the large ratio of height/width of the deposit and the increase in temperature on its upper surface. This increase also explains the transition from line-type to fiber-type growth. The hysteresis of this transition with respect to laser power and scanning velocity is explained as well. The same algorithm can be used in the modeling of pyrolytic etching and e-beam microprocessing when the feedback between the temperature distributions and changes in the processing geometry is important.

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Laser-induced deposition of tungsten from tungsten hexachloride

Cited by 18 publications

References 15 publications

Laser direct writing and instabilities: a one-dimensional approach

Laser direct writing and instabilities: a one-dimensional approach

Digital Laser Micropainting for Reprogrammable Optoelectronic Applications

Modeling of pyrolytic laser direct writing: Noncoherent structures and instabilities

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