Laser scanner for direct writing lithography

Rensch, C.; Hell, Stefan W.; Schickfus, M. von; Hunklinger, Siegfried

doi:10.1364/ao.28.003754

Cited by 47 publications

(21 citation statements)

References 3 publications

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“…There are two types of absorption mechanisms, namely one-photon absorption (OPA) and two-photon absorption (TPA). The OPA excitation method is an ideal way to fabricate one-and two-dimensional (1D and 2D) thin structures [14]. In this technique, a simple and low-cost continuous-wave (CW) laser operating at a wavelength located within the absorption band of the thin film material is used as the excitation source.…”

Section: Introductionmentioning

confidence: 99%

One-Photon Absorption-Based Direct Laser Writing of Three- Dimensional Photonic Crystals

Nguyen¹,

Trang²,

Li³

et al. 2018

Theoretical Foundations and Application of Photonic Crystals

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A simple and low-cost technique called low one-photon absorption (LOPA) direct laser writing (DLW) is demonstrated as an efficient method for structuration of multidimensional submicrostructures. Starting from the diffraction theory of the electromagnetic field distribution of a tightly focused beam, the crucial conditions for LOPA-based DLW are theoretically investigated, and then experimentally demonstrated using a simple optical confocal microscope. Various 1D, 2D, and 3D submicrostructures were successfully fabricated in different materials, such as commercial SU8 photoresist and magnetic nanocomposite. The advantages and drawbacks of this LOPA-based DLW technique were also studied and compared with the conventional two-photon absorption based DLW. Several methods were proposed to overcome the existing problem of the DLW, such as the dose accumulation and shrinkage effect, resulting in uniform structures with a small lattice constant. The LOPA-based DLW technique should be useful for the fabrication of functionalized structures, such as magneto-photonic and plasmon photonic crystals and devices, which could be interesting for numerous applications.

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Section: Introductionmentioning

confidence: 99%

One-Photon Absorption-Based Direct Laser Writing of Three- Dimensional Photonic Crystals

Nguyen¹,

Trang²,

Li³

et al. 2018

Theoretical Foundations and Application of Photonic Crystals

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“…Only a limited throughput can be obtained because of the serial working principle. 2,3 The newest and most promising technical approach for laser patterning is based on spatial light modulator (SLM) and projection imaging optical system. Different with the previous light scanners and deflectors, the SLMs are designed to transfer 2D pixelated pattern into the imaging optical systems.…”

Section: Introductionmentioning

confidence: 99%

The research of micro–nano laser patterning system based on digital micromirror device

Jin

Chen

2013

Proceedings of the Institution of Mechanical Engineers, Part N:

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This article presents the properties of the micro-nano sacle laser patterning system based on digital micromirror device. The introduction of the excellent spatial light modulator-digital micromirror device-provides a possibility for the patterning system to combine high resolution and accuracy with short writing time. The optical characteristics of the digital micromirror device-input imaging system are analyzed. An overlapping exposure method is proposed to obtain optical resolution enhancement and high fidelity of the input pattern. Based on this method, an optical synthetic-aperture effect is realized without increasing the system complexity or decreasing the process efficiency.

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“…[17] The use of lasers for patterning resists with application in lithography has been introduced more than two decades ago. [18] The advantage that DLW offers over mask-based lithography is the absence of the projection mask, an expensive part of the projection system in any optical lithography tool. The advantages over an e-beam lithography system are the cost of operation, writing time, and system stability.…”

Section: Introductionmentioning

confidence: 99%

Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates

Ivan

Vaney

Verhaart³

et al. 2009

Alternative Lithographic Technologies

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A computer-controlled laser beam recorder with a wavelength of 405 nm has been employed for patterning the deposited resist with feature sizes varying from a few hundreds of nanometers to tens of micrometers. Four inch silicon templates for hot embossing source/ drain electrodes and metallic circuit for a disposable biosensor were obtained. SEM and optical microscopy reveal accurate transfer of developed photoresist structures into the underlying silicon wafer after plasma dry etching. Etch depths between 100 -600 nm were obtained on the templates, and were further transferred into the imprinted plastic substrate and the metallic layer.

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Laser scanner for direct writing lithography

Abstract: A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.

Cited by 47 publications

References 3 publications

One-Photon Absorption-Based Direct Laser Writing of Three- Dimensional Photonic Crystals

One-Photon Absorption-Based Direct Laser Writing of Three- Dimensional Photonic Crystals

The research of micro–nano laser patterning system based on digital micromirror device

Direct laser write (DLW) as a versatile tool in manufacturing templates for imprint lithography on flexible substrates

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