2006
DOI: 10.1109/tps.2006.872163
|View full text |Cite
|
Sign up to set email alerts
|

Lateral motion of a dust particle in magnetized plasma sheath

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2006
2006
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 18 publications
(4 citation statements)
references
References 14 publications
0
4
0
Order By: Relevance
“…In figure 4(b) the size distribution for the spherical grains of radius a is obtained by solving the levitation equilibrium, equation (26), inside the sheath. The spatial derivative da/dz describes the stability of the grain inside the sheath.…”
Section: Numerical Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In figure 4(b) the size distribution for the spherical grains of radius a is obtained by solving the levitation equilibrium, equation (26), inside the sheath. The spatial derivative da/dz describes the stability of the grain inside the sheath.…”
Section: Numerical Resultsmentioning
confidence: 99%
“…The role of the magnetic field near the plasma wall has been examined in the recent past [25][26][27][28][29][30][31]. It is known that the magnetized collisional plasma-sheath characteristic is a sensitive function of the plasma parameters [31].…”
Section: Introductionmentioning
confidence: 99%
“…In the presence of dust grains, the ions and electrons in the plasma are attached to it, and the respective currents to the dust grains are governed by the OML (Orbital-Motion-Limited) theory. The equations that describe the ion and electron current to the dust grain are given by [15,43,44…”
Section: Theoretical Modelmentioning
confidence: 99%
“…Investigation of plasma sheath in presence of charged dust specie is one of the rapidly growing fields in fundamental plasma research [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15] and technology [16][17][18][19][20][21][22][23]. It includes aspects of fundamental problems of plasma physics such as hydrodynamics, the kinetics of phase transitions, nonlinear physics, solid-state physics, and several industrial applications such as etching, sputtering, thin film deposition, and ion implantation [24][25][26][27][28][29][30], etc.…”
Section: Introductionmentioning
confidence: 99%