Layer‐by‐Layer Interference Lithography of Three‐dimensional Microstructures in SU‐8

Lasagni, Andrés Fabían; Yuan, Dajun; Das, Suman

doi:10.1002/adem.200800382

Cited by 13 publications

(10 citation statements)

References 27 publications

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“…1b). The use of optical configuration with more than three laser beams enables fabrication of three-dimensional periodic structures, which are relevant for photopolymerizable materials such as photoresists [14,15].…”

Section: Resultsmentioning

confidence: 99%

To use or not to use (direct laser interference patterning), that is the question

et al. 2015

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Direct Laser Interference Patterning (DLIP) has shown to be a fabrication technology capable of producing large area periodic surface patterns on almost any kind of material. The produced structures have been used in the past to provide surfaces with new enhanced properties. On the other hand, the industrial use of this technology is still at the beginning due to the lack of appropriate and affordable systems, especially for small and medium enterprises. In this paper, the use of DLIP for the fabrication of periodic structures using different structuring strategies and optical concepts is discussed. Different technological challenges are addressed

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Section: Resultsmentioning

confidence: 99%

To use or not to use (direct laser interference patterning), that is the question

et al. 2015

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“…F) 2.5D (a 2D photonic crystal in a self‐standing high‐index material slab) periodic lattice structure of photopolymerized SU‐8 photoresist with 45° of rotation before the second irradiation step. Reproduced with permission 94. Copyright 2009, Wiley‐VCH.…”

Section: Nanophotonicsmentioning

confidence: 99%

“…For rapid and large area fabrication of 2D‐, 2.5D‐, and 3D‐planar periodic structures with micrometer scale features, Lasagni et al presented an alternative method using a layer‐by‐layer interference patterning approach 94. Figure 14F shows a lattice‐like structure, using SU‐8 photoresist with a substrate rotation of 45° before the exposure of the second layer.…”

Section: Nanophotonicsmentioning

confidence: 99%

Nanostructures and Functional Materials Fabricated by Interferometric Lithography

et al. 2010

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Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with IL are a platform for further fabrication of nanostructures and growth of functional materials and are building blocks for devices. This article provides a brief review of IL technologies and focuses on various applications for nanostructures and functional materials based on IL including directed self-assembly of colloidal nanoparticles, nanophotonics, semiconductor materials growth, and nanofluidic devices. Perspectives on future directions for IL and emerging applications in other fields are presented.

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“…An example two-beam configuration to record a 1D grating utilizing a single beam splitter and beam-directing mirrors is depicted in Figure 4(a). In any two-beam configuration, multiple exposures are required to generate more complex 2D and 3D patterns in a photo-sensitive material [76][77][78][79]. This is often accomplished by incorporating a rotating sample stage at the recording plane [80][81][82][83].…”

Section: Multi-beam Interference Configurationsmentioning

confidence: 99%

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Burrow

Gaylord

2011

Micromachines

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Abstract:Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro-and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.

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Layer‐by‐Layer Interference Lithography of Three‐dimensional Microstructures in SU‐8

Cited by 13 publications

References 27 publications

To use or not to use (direct laser interference patterning), that is the question

To use or not to use (direct laser interference patterning), that is the question

Nanostructures and Functional Materials Fabricated by Interferometric Lithography

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

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