Layer uniformity obtained by vacuum evaporation: application to Fabry-Perot filters

Grèzes-Besset, Catherine; Richier, R.; Pelletier, E.

doi:10.1364/ao.28.002960

Cited by 11 publications

(3 citation statements)

References 8 publications

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“…The main shortcoming of masked depositions is less efficient material utilization [25]. In the literature, mask designs for different substrate holder geometries are proposed [53][54][55][56]. Systems with masks or planetary rotations can only be analyzed for film thickness distribution using simulation.…”

Section: Simulation Of Film Thickness Distribution For Evaporation Anmentioning

confidence: 99%

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

Wang

Song

et al. 2018

Coatings

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Optimization of thin film uniformity is an important aspect for large-area coatings, particularly for optical coatings where error tolerances can be of the order of nanometers. Physical vapor deposition is a widely used technique for producing thin films. Applications include anti-reflection coatings, photovoltaics etc. This paper reviews the methods and simulations used for improving thin film uniformity in physical vapor deposition (both evaporation and sputtering), covering characteristic aspects of emission from material sources, projection/mask effects on film thickness distribution, as well as geometric and rotational influences from apparatus configurations. Following the review, a new program for modelling and simulating thin film uniformity for physical vapor deposition was developed using MathCAD. Results from the program were then compared with both known theoretical analytical equations of thickness distribution and experimental data, and found to be in good agreement. A mask for optimizing thin film thickness distribution designed using the program was shown to improve thickness uniformity from ±4% to ±0.56%.

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Section: Simulation Of Film Thickness Distribution For Evaporation Anmentioning

confidence: 99%

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

Wang

Song

et al. 2018

Coatings

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“…In this case, non predictable dynamic errors appear due to the fluctuation of uniformity through time during the deposition process, that lead to disastrous alterations (Figure 3) of the spectral profile on the components. We observe that peripheral samples are strongly altered, contrary to the monitor sample [2]. Numerical calculation proves that some design errors close to 1 or 2 nm in a few layers are enough to explain the spectral shape of Figure 3.…”

Section: Improvement With Lateral Monitoringmentioning

confidence: 69%

Real-time lateral optical monitoring for the production of complex multilayer stacks

Grèzes-Besset¹,

Torricini²,

Chazallet³

2005

SPIE Proceedings

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We present a direct optical monitoring system that allows to minimize in-situ shift of parameters during process. In particular, we show how real-time optical monitoring on one or several lateral samples located on the same circumference of final components overcomes the problem of uniformity time dependence for long process and allows the fabrication of complex optical functions. Real time signal processing on transmittance versus wavelength is used to determine in-situ refractive index of deposited material for each layer in the multilayer stack. It is shown how this method can be applied to the realization of quarter-wave and non quarter-wave stacks and the repeatability of a fully automated process is demonstrated for different components such as narrow band filters, polarizers or edge filters. Numerous experimental results from different deposition techniques are presented.

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“…Coating uniformity can be improved by many methods, such as the use of coater design with special masks, 3) and by choosing the appropriate source position, 4) source material, monitor system, 5) and coating process. 6,7) However, the aforementioned techniques are necessary for film uniformity, but not sufficient. We report on a study of stresses in a DWDM filter that influence center wavelength shift in post deposition thermal treatments.…”

Section: Introductionmentioning

confidence: 99%

Optical and Mechanical Property Changes in Thin-Film Filters with Post Deposition Thermal Treatments

Wei

Shieh

2006

jjap

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Layer uniformity obtained by vacuum evaporation: application to Fabry-Perot filters

Cited by 11 publications

References 8 publications

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition

Real-time lateral optical monitoring for the production of complex multilayer stacks

Optical and Mechanical Property Changes in Thin-Film Filters with Post Deposition Thermal Treatments

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