Layered Si–Ti oxide thin films with tailored electrical and optical properties by catalytic tandem MLD-ALD

Abstract

Layer-by-layer deposition of Si–Ti layered oxide thin films are obtained using catalytic tandem M/ALD methodology. The films exhibit optical (RI) and electrical conductivities by selecting the MLD to ALD proportion in the super cycle.

Combined Atomic and Molecular Layer Deposition Surface Modification of Carbon Nanotubes for CNT–Epoxy Polymer Composites

“…Si2p gave two peaks at 102.0 and 102.6 eV associated with Si –O–Ti and Si –O–Si, respectively (Figure e) . This is in agreement with the Si–O–Si and Si–O–Ti interfacial bonds in the M/ALD layer growth mechanism previously reported by us …”

“…30 This is in agreement with the Si−O−Si and Si−O−Ti interfacial bonds in the M/ALD layer growth mechanism previously reported by us. 7 Ti2p XPS spectra (Figure 7d) showed two peaks at 458.3 and 458.7 eV, corresponding to the two species, Ti−O−Ti and Ti−O−Si, respectively. 31 O1s spectra reveal the formation of Ti−O−Ti, Ti−O−Si, and Si−O−Si species, with binding energies of 530.5, 531.3, and 532.3 eV, respectively (Figure 7c).…”

“…Specifically, we employ a recently reported M/ALD methodology yielding hybrid organic−inorganic Si− Ti thin films with molecular level control of the layer thickness, molecular functionalities, and composition. 7 The M/ALD hybrid film deposition is attained by catalytic tandem M/ALD which was reported in detail elsewhere. By using vapor phase chemistry for tailoring the CNT surface and forming the mediating interphase layer, solvent compatibility problems are overridden.…”

“…Relying on the vapor phase surface modification of the CNTs results in well-controlled surface modification of the high-density CNT mats and straightforward incorporation with the epoxy polymer matrix to yield high-loading CNT–epoxy composites (HLC). Specifically, we employ a recently reported M/ALD methodology yielding hybrid organic–inorganic Si–Ti thin films with molecular level control of the layer thickness, molecular functionalities, and composition . The M/ALD hybrid film deposition is attained by catalytic tandem M/ALD which was reported in detail elsewhere …”

“…Specifically, we employ a recently reported M/ALD methodology yielding hybrid organic–inorganic Si–Ti thin films with molecular level control of the layer thickness, molecular functionalities, and composition . The M/ALD hybrid film deposition is attained by catalytic tandem M/ALD which was reported in detail elsewhere …”