Spin electronics is delivering a much desired combination of properties such as high speed, low power, and high device densities for the next generation of memory devices. Utilizing chiral-induced spin selectivity (CISS) effect is a promising path toward efficient and simple spintronic devices. To be compatible with state-of-the-art integrated circuits manufacturing methodologies, vapor phase methodologies for deposition of spin filtering layers are needed. Here, we present vapor phase deposition of hybrid organic–inorganic thin films with embedded chirality. The deposition scheme relies on a combination of atomic and molecular layer deposition (A/MLD) utilizing enantiomeric pure alaninol molecular precursors combined with trimethyl aluminum (TMA) and water. The A/MLD deposition method deliver highly conformal thin films allowing the fabrication of several types of nanometric scale spintronic devices. The devices showed high spin polarization (close to 100%) for 5 nm thick spin filter layer deposited by A/MLD. The procedure is compatible with common device processing methodologies.

Doping methodologies using monolayers offer controlled, ex situ doping of nanowires (NWs), and 3D device architectures using molecular monolayers as dopant sources with uniform, self‐limiting characteristics. Comparing doping levels and uniformity for boron‐containing monolayers using different methodologies demonstrates the effects of oxide capping on doping performances following rapid thermal anneal (RTA). Strikingly, for noncovalent monolayers of phenylboronic acid (PBA), highest doping levels are obtained with minimal thermal budget without applying oxide capping. Monolayer damage and entrapment of molecular fragments in the oxide capping layer account for the lower performance caused by thermal damage to the PBA monolayer, which results in transformation of the monolayer source to a thin solid source layer. The impact of the oxide capping procedure is demonstrated by a series of experiments. Details of monolayer fragmentation processes and its impact on doping uniformity at the nanoscale are addressed for two types of surface chemistries by applying Kelvin probe force microscopy (KPFM). These results point at the importance of molecular decomposition processes for monolayer‐based doping methodologies, both during preanneal capping step and during rapid thermal processing step. These are important guidelines to be considered for future developments of appropriate surface chemistry used in monolayer doping applications.

Layer-by-layer deposition of Si–Ti layered oxide thin films are obtained using catalytic tandem M/ALD methodology. The films exhibit optical (RI) and electrical conductivities by selecting the MLD to ALD proportion in the super cycle.

Optimizing the interactions between the matrix and reinforcement components is key to attaining high-performance composite materials. Yet, balancing the reinforcing–matrix phase interactions for synthetic composites remains a great challenge. Here, a combined methodology using molecular and atomic layer deposition (M/ALD) is demonstrated for tailoring carbon nanotube (CNT) interfacial interactions, yielding high-performance-reinforced polymer composites. CNT mats are used as a model system to systematically study the molecular details as they do not involve powder processing and other aspects which obscure the understanding of molecular level effects. Noncovalent attachment of the M/ALD layer at the interface allows good wetting of the CNTs, provides an effective means for stress dissipation without compromising the CNTs’ Csp2–Csp2 network which remains intact, while introducing amine functionalities to facilitate the cross-linking polymer matrix (epoxy). M/ALD-modified CNT mat–epoxy composites showed an increase in the maximal tensile strength and toughness of up to 32 and 247%, respectively. These findings may pave the way to systematically develop high CNT loading composites as well as other nano-reinforced composite systems showing both high strength and toughness as well as numerous other desirable properties related to nanomaterial composites in general.