2012
DOI: 10.1109/tsm.2012.2200510
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Lens Heating Induced Aberration Prediction via Nonlinear Kalman Filters

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Cited by 13 publications
(3 citation statements)
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“…Thermally-induced mechanical deformations, wavefront aberrations, and large focal shifts can negatively affect performance and significantly limit the resolution of both refractive and reflective optical systems. For example, thermal phenomena and thermally-induced aberrations can limit the achievable resolution and performance of optical lithography systems, [1][2][3][4][5][6][7][8][9][10] space and ground telescopes, [11][12][13][14][15][16][17][18][19][20][21][22][23] gravitational wave detectors, [24][25][26] high power lasers, [27][28][29] and other optical systems. [30][31][32][33] In the case of refractive optical systems consisting of lenses, absorbed thermal energy and non-uniform temperature distributions across optical elements, induce mechanical deformations and variations of refractive indices.…”
Section: Introductionmentioning
confidence: 99%
“…Thermally-induced mechanical deformations, wavefront aberrations, and large focal shifts can negatively affect performance and significantly limit the resolution of both refractive and reflective optical systems. For example, thermal phenomena and thermally-induced aberrations can limit the achievable resolution and performance of optical lithography systems, [1][2][3][4][5][6][7][8][9][10] space and ground telescopes, [11][12][13][14][15][16][17][18][19][20][21][22][23] gravitational wave detectors, [24][25][26] high power lasers, [27][28][29] and other optical systems. [30][31][32][33] In the case of refractive optical systems consisting of lenses, absorbed thermal energy and non-uniform temperature distributions across optical elements, induce mechanical deformations and variations of refractive indices.…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, due to a constant demand for higher productivity and less production costs, the power transmitted through the projection optics of lithography machines constantly increases. Consequently, the energy absorbed by projection optics induces wavefront aberrations that can compromise the resolution of the system [8][9][10][11][12]. In the next generation of optical lithography machines, that will use Extreme UltraViolet (EUV) sources, degradation of resolution due to the heating of optical elements will become even more severe [13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, the possibility of transferring an existing imaging solution from a DUV wafer scanner to an EUV tool is usually ruled out because of the inherent physical differences between these two machines. In the scope of imaging quality, the reticle (mask) [4] and elements of the projection optics [5] are primarily responsible for image deteriorations, and despite the altered design in an EUV tool, the significance of these contributors remains intact. In particular, the context of this paper is restricted to the thermally induced deformation of an EUV reticle.…”
mentioning
confidence: 99%