Lensless EUV Lithography and Imaging

Mochi, Iacopo; Ekinci, Yasin

doi:10.1080/08940886.2019.1634433

Cited by 5 publications

(6 citation statements)

References 17 publications

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“…To evaluate Zn(MA)(TFA) as a photoresist for EUV lithography, dense L/S patterns on the thin film (22-50 nm) were printed using the EUV-IL tool at the Paul Scherrer Institute. 48 SEM images (Fig. 1c) show that the transfer of L/S patterns needed a notably low dose.…”

Section: Resultsmentioning

confidence: 96%

Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography

et al. 2020

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Section: Resultsmentioning

confidence: 96%

Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography

et al. 2020

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“…RESCAN is a lensless microscope dedicated to EUV mask inspection operating at the Swiss Light Source synchrotron. 3 The microscope relies on coherent diffraction imaging (CDI) to reconstruct the complex amplitude of the mask surface.…”

Section: Apparatus Review: Rescan Euv Metrologymentioning

confidence: 99%

Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks

Robinson

LeClaire

Mochi

et al. 2021

Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology

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In prior work, progress was shown in the systematic characterization of the process space for efficient and effective repair of extreme ultraviolet (EUV) photomasks using an ultrafast (femtosecond) pulsed deep ultraviolet (DUV) laser apparatus. In this work, the full analysis and conclusions, along with any additional test results are shown. This includes an analysis of the impact of laser repair on the phase shift of the multilayer using multiple processes.

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“…RESCAN is a lensless microscope dedicated to EUV mask inspection operating at the Swiss Light Source synchrotron. 2 The microscope relies on coherent diffraction imaging (CDI) to reconstruct the complex amplitude of the mask surface.…”

Section: Apparatus and Overall Test Proceduresmentioning

confidence: 99%

“…The complex amplitude of the sample is reconstructed using ptychography 3 , a noise-robust CDI technique that makes it possible to retrieve the phase and the amplitude of the object under investigation. RESCAN can detect amplitude defects as small as 50x50 nm 2 and characterize the phase of buried structures with an uncertainty of 2%. 4 In the current experiment, each of the reconstructed images has a pixel size of 32.5 nm and a spatial resolution of 45 nm.…”

Section: Apparatus and Overall Test Proceduresmentioning

confidence: 99%