1998
DOI: 10.1016/s0167-9317(98)00055-0
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Lifetime enhancement of a multicusp ion source for lithography

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Cited by 4 publications
(3 citation statements)
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“…The two types of plasma ion sources known as the Penning type [66][67][68][69][70][71][72][73][74][75] and the multicusp type [76][77][78][79][80][81][82][83][84][85][86][87] have been widely studied for focused beam applications. We will discuss these plasma ion sources and compare them with the LMIS.…”
Section: B Plasma Gas Ion Sourcesmentioning
confidence: 99%
See 1 more Smart Citation
“…The two types of plasma ion sources known as the Penning type [66][67][68][69][70][71][72][73][74][75] and the multicusp type [76][77][78][79][80][81][82][83][84][85][86][87] have been widely studied for focused beam applications. We will discuss these plasma ion sources and compare them with the LMIS.…”
Section: B Plasma Gas Ion Sourcesmentioning
confidence: 99%
“…[76][77][78][79][80][81][82][83][84][85][86][87] The ion source uses permanent magnets around the cylindrical wall as well as on the opposite side of the extraction aperture ͓see Fig. 8͑c͔͒.…”
Section: Multicusp Type Plasma Ion Sourcesmentioning
confidence: 99%
“…A MIS has been reported to have stable discharge, small beam emittance, low axial energy spread, and high gas efficiency for single charged ions. [12][13][14] This would fulfill the requirements of having average beam current of 15 A, energy stability of Ϯ0.1%, and timing resolution less than 1.5 ns. Besides, the low axial energy spread would enable us to use microbeam applications at a later time.…”
Section: Introductionmentioning
confidence: 99%