“…A variety of methods, including wet etching with an amorphous sacrificial layer [6][7][8][9] or by laser etching to obtain a more periodic spacing [10][11][12][13][14], can etch a transmission grating on a semiconductor surface. In previous literature, the same patterning can also apply, with a similar effect, to an Ag reflector plate in either pillar or hole grating shapes to form a reflection grating [15][16]. Finally, if one could exchange the semiconductor for a polymer, such as polyphenylene vinylene (PPV), polyfluorene, or poly(N-vinylcarbazole) (PVK), the critical angle could be reduced, due to a polymer's lower index of refraction.…”