Light scattering model for individual sub-100-nm particle size determination in an evanescent field

Abstract

In this paper, we propose an optical method for observation and determination of individual nanosized particles that adhere to an interface by applying an evanescent field. Subsequently, we developed a portable (∼350 mm in length) experimental apparatus equipped with an optical microscopy system for particle observation. The observed intensity is consistent with that calculated using a light scattering model of sub-100-nm particles in the evanescent field.

3D trajectories and diffusion of single ceria particles near a glass surface and their removal

“…[12] with permission from the Journal of Materials Research). Processing of incoming data in real time with digital signal processing was reported previously [12,13,14]; see the Experimental section for details.…”

“…In our experimental setup, an EW is generated when the laser light beam having 15 mW power at 532 nm wavelength (Edmund Optics, Barrington, NJ, USA) undergoes total internal reflection at the glass lens-ceria suspension interface [12,13,14]. The incident angle θ i was adjusted to 69.5 ± 1.0°, and the penetration depth β of the EW field was 88.0 ± 4.5 nm.…”

“…Given the results reported by Liu et al [37,38], less than 1°C change in the local temperature at the particleglass interface in our experiments conditions is expected, which is negligible. The details of EW microscopy setup, the experimental conditions, and data analysis were reported in our earlier publications [12,13,14].…”

A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization

“…microscopy [135]. Thus, more light needs to be collected by the objective lens to make the imaging of smaller particles possible.…”

A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization

“…Abrasive particles move far away rapidly from the glass surface by the slurry flow and the platen rotation and sometimes disappear from the field of view, preventing long-term particle tracking in the EW field. Moreover, the smaller particles, less than 100 nm particles used in the actual CMP system, scatter less light making them more challenging to detect using EW microscopy [135]. Thus, more light needs to be collected by the objective lens to make the imaging of smaller particles possible.…”