Light trapping effect of nanoimprinted-textured crystalline silicon solar cells

Yoshinaga, Seiya; Ishikawa, Yasuaki; Araki, Satoshi; Uraoka, Yukiharu

doi:10.1109/pvsc.2013.6744383

Cited by 4 publications

(7 citation statements)

References 11 publications

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“…ZrO 2 is more suitable than ZnO as a texture material since ZrO 2 has a higher refractive index and wider bandgap than ZnO. 15) In this study, we optimized the shape and size of surfaces textured by NIL using ZrO 2 by performing two-dimensional (2D) and threedimensional (3D) numerical analyses, and we also verified the effect of the surface area of the semiconductor on V OC .…”

Section: Introductionmentioning

confidence: 80%

“…This texture structure was employed because it had been previously calculated to yield the highest short-circuit current density (J SC ). 15) We designed textures with not only pyramid structures but also pillar, moth-eye, and inverted moth-eye structures on a c-Si substrate, as shown in Fig. 2.…”

Section: Simulation Methodsmentioning

confidence: 99%

“…It has been reported that a micron-scale texture is too coarse to suppress surface reflectance and that a submicron-scale texture is more effective in improving the conversion efficiency. [13][14][15] Although ICP-RIE enables cells to have a nanoscale texture, it increases surface recombination owing to the plasma damage that occurs during the texturing process. 16) It is possible to remove the defects induced by RIE and fabricate solar cells with an enhanced blue response; however, the problem of surface area enlargement introduced by the nano-texturing remains.…”

Section: Introductionmentioning

confidence: 99%

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Numerical analysis of monocrystalline silicon solar cells with fine nanoimprinted textured surface

Yoshinaga¹,

Ishikawa²,

Araki³

et al. 2017

Jpn. J. Appl. Phys.

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We investigated the surface reflectance of nanoimprinted textures on silicon. Zirconium oxide, which is a wide-bandgap inorganic dielectric material, was used as the texturing material. We performed several calculations to optimize the textures for the production of high-efficiency bulk-type monocrystalline silicon solar cells. Our analysis revealed that nanoimprinted textured solar cells exhibit a lower reverse saturation current density than a solar cell with a conventional etched texture. It was also confirmed that the photocarrier generation rate for a solar cell with a submicron-scale nanoimprinted texture has little dependence on the texture shape. Furthermore, the weighted average reflectance of an optimized nanoimprinted textured solar cell was substantially reduced to 3.72%, suggesting that texture formation by nanoimprint lithography is an extremely effective technology for producing high-efficiency solar cells at a low cost.

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Section: Introductionmentioning

confidence: 80%

Section: Simulation Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Numerical analysis of monocrystalline silicon solar cells with fine nanoimprinted textured surface

Yoshinaga¹,

Ishikawa²,

Araki³

et al. 2017

Jpn. J. Appl. Phys.

Self Cite

View full text Add to dashboard Cite

show abstract

Section: Introductionmentioning

confidence: 99%

“…We have proposed that the nanoimprinted texture with submicron-scale ZrO 2 has given us similar surface reflectance as low as a conventional etched-texture surface [17]. However, ZrO 2 is a relatively hard material to be formed in a nanoscale structure, so an alternative material such as ZnO has also been considered as a nanoimprinted-texture material though the surface reflectance is a little bit larger than that with ZrO 2 [17]. In the previous report, the experimentally-fabricated nanoimprinted-texture structure showed slightly higher surface reflectance than the conventional etched-pyramid-texture structure with silicon nitride (SiN), which is an ARC, since the differences between the refractive index of the nanoimprintedtextured material and the substrate was large [18].…”

Section: Introductionmentioning

confidence: 99%

Low surface reflectance by nanoimprinted texture with silicon-rich silicon nitride layer

Yoshinaga¹,

Ishikawa²,

Uraoka³

2017

J. Phys. D: Appl. Phys.

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Texture structure is usually fabricated on crystalline silicon (c-Si) solar cells to provide a low surface reflectance by an etching method such as alkali solution. In this study, we proposed nanoimprint lithography (NIL) as a fabrication process of the texture structure on the flat c-Si surface. The fabricated nanoimprinted texture which is a moth-eye structure by zinc oxide still has a high interface reflectance since the differences of the refractive index between the texture material and the c-Si substrate is large. We proposed an insertion of a Si-rich silicon nitride (SiN) layer between the texture and the substrate to solve this problem, and confirmed that the inserted Si-rich SiN shows remarkable benefits in terms of lowering the surface reflectance and providing a high carrier lifetime of the Si absorber, simultaneously.

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Research and development efforts on texturization to reduce the optical losses at front surface of silicon solar cell

Abdullah

Alghoul

Naser

et al. 2016

Renewable and Sustainable Energy Reviews

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Light trapping effect of nanoimprinted-textured crystalline silicon solar cells

Cited by 4 publications

References 11 publications

Numerical analysis of monocrystalline silicon solar cells with fine nanoimprinted textured surface

Numerical analysis of monocrystalline silicon solar cells with fine nanoimprinted textured surface

Low surface reflectance by nanoimprinted texture with silicon-rich silicon nitride layer

Research and development efforts on texturization to reduce the optical losses at front surface of silicon solar cell

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