2012
DOI: 10.1088/0268-1242/27/11/115006
|View full text |Cite
|
Sign up to set email alerts
|

Linear non-hysteretic gating of a very high density 2DEG in an undoped metal–semiconductor–metal sandwich structure

Abstract: Modulation doped GaAs-AlGaAs quantum well based structures are usually used to achieve very high mobility 2-dimensional electron (or hole) gases. Usually high mobilities (> 10 7 cm 2 V −1 s −1 ) are achieved at high densities. A loss of linear gateability is often associated with the highest mobilites, on account of a some residual hopping or parallel conduction in the doped regions. We have developed a method of using fully undoped GaAs-AlGaAs quantum wells, where densities ≈ 6 × 10 11 cm −2 can be achieved w… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
7
0

Year Published

2013
2013
2024
2024

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(7 citation statements)
references
References 21 publications
0
7
0
Order By: Relevance
“…They can be dissolved by a 30 s dip in a hydroxide potassium solution (25 g/100 ml dionized water). Our experience showed that a full chemical etching of the substrate instead of a combination mechanical polishing/chemical etching [37,38] reduces the risk of cracks on the thin semiconductor heterostructure. Another cycle of (H 2 O 2 +citric acid) + HF etches the 300 nm GaAs buffer layer and the 30 nm Al 0.75 Ga 0.25 As second etch stop.…”
Section: Design and Fabrication Of The Devicesmentioning
confidence: 97%
See 1 more Smart Citation
“…They can be dissolved by a 30 s dip in a hydroxide potassium solution (25 g/100 ml dionized water). Our experience showed that a full chemical etching of the substrate instead of a combination mechanical polishing/chemical etching [37,38] reduces the risk of cracks on the thin semiconductor heterostructure. Another cycle of (H 2 O 2 +citric acid) + HF etches the 300 nm GaAs buffer layer and the 30 nm Al 0.75 Ga 0.25 As second etch stop.…”
Section: Design and Fabrication Of The Devicesmentioning
confidence: 97%
“…The electron transport in the two quantum wells being coupled, resonant tunneling phenomena were studied with this method. Rather high mobilities of about 3.3 × 10 5 cm 2 V −1 s −1 (for an electron density between 1 and 4 × 10 11 cm −2 ) in a doped [37] and nearly 10 7 cm 2 V −1 s −1 (for an electron density of 5.8 × 10 11 cm −2 ) in an undoped heterostructure were demonstrated [38]. However, the thickness of the heterostructure and its gate stack was a few microns, which is much too large to achieve sufficiently tight exciton confinement and to realize single-electron quantum dots.…”
mentioning
confidence: 96%
“…The electrochemical potential itself goes down as one moves out from the quantum well, the positive voltage bias on the gates attract electrons (positive bias lowers the electrochemical potential, in the usual convention followed). The combination of these two also ensures that parallel conduction in dopant layers can be eliminated [17]. The bias on the two gates need to be adjusted to tune the shape and tilt of the wavefunction in the quantum well.…”
Section: Design Of An Ambipolar Quantum Well Transistormentioning
confidence: 99%
“…A lithographic backgate also has distinct advantages over an in-situ n+ backgate, such as the ability to only act upon a defined region. However the two-sided metalsemiconductor-metal sandwich structure shown in fig 2 requires a flip-chip process originally introduced by Weckwerth et al [18] and further developed by us [17]. Unlike modulation doped GaAs/AlGaAs structures, there are no intentional dopants in the system.…”
Section: Design Of An Ambipolar Quantum Well Transistormentioning
confidence: 99%
“…Field-effect-induced two-dimensional electron gases (2DEGs) and two-dimensional hole gases (2DHGs) in undoped GaAs/ AlGaAs heterostructures offer a number of advantages over their modulation-doped counterparts. The absence of doping results in higher carrier mobilities at low carrier densities [1] and more reliable control of the carrier density by an applied gate voltage [2,3]. 2DEGs and quantum dots can be formed as shallow as 30 nm below the surface [4,5], and it becomes possible to define finer features using surface gates, as a spacer layer (between the 2DEG and the dopants) is no longer needed.…”
Section: Introductionmentioning
confidence: 99%