Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Moskovkin, Pavel; Maszl, Christian; Schierholz, Roland; Breilmann, Wolfgang; Petersen, Jan; Pflug, Andreas; Müller, Jérôme; Raza, Mohsin; Konstantinidis, Stéphanos; Keudell, Achim von; Lucas, Stéphane

doi:10.1016/j.surfcoat.2021.127235

Cited by 14 publications

(9 citation statements)

References 44 publications

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“…The film thickness was ∼5 nm with density of ∼4.36-4.43 g cm −3 . This thickness was thinner than the experimental deposition (∼280-400 nm) so that the film microstructures between simulation and experiments may be different as discussed in [49]. However, in our mind, this simulation can still reveal the effect of ion energy on the nucleation and film roughness, qualitatively, because these properties are mainly related to the substrate surface condition and ion energy in fact.…”

Section: Ti Films Deposition and MD Simulationmentioning

confidence: 82%

“…Figures 11 (a) and (b) shows the Ti atom distributions on the Si surface at the initial period (t = 50 ps) of deposition when the adsorbed Ti atoms have not coated the Si substrate completely. At r H = 20%, lots of individual atoms without nucleation appear on the Si surface (marked by the red circle), illustrating that their energy are lower than the threshold for free diffusion [49]. The local details are given in figure 12(b), correspondingly, that three individual Ti atoms are marked in red ball.…”

Section: Deposition Of Ti Filmsmentioning

confidence: 98%

“…Therefore, in figure 12(b) at r H = 20%, the low-energy Ti atom prefers to stay static at their initial deposited positions, unless an incident high-energy atom/ion impact it and the energy transfer between each other. For this reason, the film growth trends to be an island type (Volmer-Weber type) [49]. Especially, the barriers for the adatoms diffusing along the island edges and hopping from one layer to another are typically higher than the free diffusion [58]; thus, the low-energy atom flux (<0.5 eV) make the nucleation behaviour much 'gentler'.…”

Section: Deposition Of Ti Filmsmentioning

confidence: 99%

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Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Luo¹,

Han²,

Su³

et al. 2022

Plasma Sources Sci. Technol.

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As an emerging and extraordinary plasma source, bipolar pulsed high power impulse magnetron sputtering (BP-HiPIMS) discharge has been widely concerned by academia and industry due to the ability to control the deposited ion energy. In the present work, with the intension of increasing the high-energy ion fraction and flux during deposition, the BP-HiPIMS is operated together with a solenoidal coil installed in front of the target. This intension is achieved by applying a pulsed coil current so that the ions generated during the high-power negative pulse can be manipulated to diffuse towards substrate and then arrive at the substrate surface during the positive pulse. Systematic investigations of discharge characteristics and plasma parameters for Ti target discharge in Ar gas have been made, illustrating that applying a pulsed coil current prior to the positive pulse onset for ~50 μs is an optimal selection to obtain a larger fraction of high-energy ions. The complex plasma dynamics has also been explored using the particle-in-cell/Monte Carlo collision approach. To verify the statements realized by plasma measurements, the Ti films have been deposited on a floating Si substrate, whose microstructure and surface morphology are characterized by FESEM and AFM. The deposition illustrates that applying a pulsed coil current prior to the positive pulse onset for ~50 μs can prepare a thicker, denser, and smoother Ti film. The link between the plasma parameters and film microstructure is studied using the MD simulations which show that the high-energy ions contribute to optimizing the adatom diffusion and mobility on growing film surface, which is more beneficial to get a smaller grain size and decrease the film surface roughness.

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Section: Ti Films Deposition and MD Simulationmentioning

confidence: 82%

Section: Deposition Of Ti Filmsmentioning

confidence: 98%

Section: Deposition Of Ti Filmsmentioning

confidence: 99%

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Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Luo¹,

Han²,

Su³

et al. 2022

Plasma Sources Sci. Technol.

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“…As discussed in Section 2.1 , during the growth process, high-valence state plasma also acquires kinetic energy from the bias voltage, disrupting the continuous growth of columnar crystals and even re-sputtering loose grains, ensuring coating densification. Therefore, high-flux ionization excited by HiPIMS can surmount the typical low-density and rough microstructure, resulting in a unique morphology attained by low-temperature sputter deposition [ 33 , 40 , 109 , 110 , 111 , 112 , 113 , 114 , 115 ]. In comparison to coatings deposited by DCMS, HiPIMS imparted a higher hardness, lower friction coefficient, and better adhesion, wear resistance, and corrosion resistance to the coating [ 93 ].…”

Section: The Influence Of Hipims and Dcms Techniques On The Growth Of...mentioning

confidence: 99%

Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering

Bai,

Li,

Gao

et al. 2023

Materials

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Chromium Nitride (CrN) coatings have widespread utilization across numerous industrial applications, primarily attributed to their excellent properties. Among the different methods for CrN coating synthesis, direct current magnetron sputtering (DCMS) has been the dominant technique applied. Nonetheless, with the expanded applications of CrN coatings, the need for enhanced mechanical performance is concurrently escalating. High-power impulse magnetron sputtering (HiPIMS), an innovative coating deposition approach developed over the past three decades, is gaining recognition for its capability of yielding coatings with superior mechanical attributes, thereby drawing significant research interest. Considering that the mechanical performance of a coating is fundamentally governed by its microstructural properties, a comprehensive review of CrN coatings fabricated through both techniques is presented. This review of recent literature aims to embark on an insightful comparison between DCMS and HiPIMS, followed by an examination of the microstructure of CrN coatings fabricated via both techniques. Furthermore, the exploration of the underlying factors contributing to the disparities in mechanical properties observed in CrN coatings is revealed. An assessment of the advantages and potential shortcomings of HiPIMS is discussed, offering insight into CrN coating fabrication.

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“…It is known that quite a few factors will affect the measured hardness of a deposited film, such as sputtering power, bias voltage, and even the (nano)indentation techniques used to measure hardness. There is limited published literature on the hardness of pure Ti films; however, in a few publications, the reported hardness of Ti-films varies from 2.4~10 GPa depending on the deposition method, coating thickness and crystallographic orientation [20,[38][39][40][41][42][43][44][45]. It is also noticeable that DCMS sputtered films being found to have a lower hardness (~8GPa) than EB-evaporated films (~10GPa) in the study of Arshi et al [45] .…”

Section: Film Hardnessmentioning

confidence: 99%

Deposition of titanium films on complex bowl-shaped workpieces using DCMS and HiPIMS

Xie¹,

Wei²,

Liu³

et al. 2022

Surface and Coatings Technology

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Link between plasma properties with morphological, structural and mechanical properties of thin Ti films deposited by high power impulse magnetron sputtering

Cited by 14 publications

References 44 publications

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Adjustment of high-energy ion flux in BP-HiPIMS via pulsed coil magnetic field: plasma dynamics and film deposition

Comparison of CrN Coatings Prepared Using High-Power Impulse Magnetron Sputtering and Direct Current Magnetron Sputtering

Deposition of titanium films on complex bowl-shaped workpieces using DCMS and HiPIMS

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